Dr. Hans Willy Becker
at SCHOTT Lithotec AG
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 20 October 2006 Paper
Hans Becker, Markus Renno, Guenter Hess, Ute Buttgereit, Corinna Koepernik, Lorenz Nedelmann, Mathias Irmscher, Robert Birkner, Axel Zibold, Thomas Scheruebl
Proceedings Volume 6349, 63490J (2006) https://doi.org/10.1117/12.686022
KEYWORDS: Photomasks, Phase shifts, Etching, Silica, Tantalum, Lithography, Optical lithography, Semiconducting wafers, Scanners, Phase shifting

Proceedings Article | 19 May 2006 Paper
Proceedings Volume 6283, 62831G (2006) https://doi.org/10.1117/12.681883
KEYWORDS: Tantalum, Phase shifts, Photomasks, Lithography, Line width roughness, Polarizers, Scanners, Lithographic illumination, Polarization, Manufacturing

Proceedings Article | 19 May 2006 Paper
Corinna Koepernik, Hans Becker, Robert Birkner, Ute Buttgereit, Mathias Irmscher, Lorenz Nedelmann, Axel Zibold
Proceedings Volume 6283, 62831D (2006) https://doi.org/10.1117/12.681877
KEYWORDS: Photomasks, Etching, Nanoimprint lithography, Phase shifts, Tantalum, Semiconducting wafers, Tolerancing, Optical lithography, Lithography, Transmittance

Proceedings Article | 4 November 2005 Paper
Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess
Proceedings Volume 5992, 59920I (2005) https://doi.org/10.1117/12.632113
KEYWORDS: Reflection, Antireflective coatings, Photomasks, Binary data, Inspection, Phase shifts, Interfaces, Etching, Lithography, Opacity

Proceedings Article | 5 October 2005 Paper
Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess
Proceedings Volume 5963, 59630J (2005) https://doi.org/10.1117/12.625210
KEYWORDS: Inspection, Etching, Phase shifts, Photomasks, Tantalum, Dry etching, Lithography, Phase shifting, Reflection, Oxides

Proceedings Article | 28 June 2005 Paper
Corinna Koepernik, H. Becker, J. Butschke, U. Buttgereit, M. Irmscher, L. Nedelmann, F. Schmidt, S. Teuber
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617110
KEYWORDS: Etching, Tantalum, Chromium, Reactive ion etching, Optical lithography, Phase shifts, Dry etching, Diffractive optical elements, Oxygen, Photomasks

Proceedings Article | 16 June 2005 Paper
Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599688
KEYWORDS: Photomasks, Polarization, Diffraction, Phase shifts, Tantalum, Binary data, Etching, Lithography, Reticles, Absorbance

Proceedings Article | 6 May 2005 Paper
Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538
KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

Proceedings Article | 6 December 2004 Paper
Frank Sobel, Lutz Aschke, Markus Renno, Holger Seitz, Hans Becker, Nathalie Olschewski, Torsten Reichardt, Guenter Hess, Ute Buttgereit, Konrad Knapp, Florian Letzkus, Joerg Butschke, Corinna Koepernik
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568787
KEYWORDS: Coating, Reflectivity, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Dry etching, Inspection, Manufacturing, Multilayers

Proceedings Article | 6 December 2004 Paper
Hans Becker, Pascal Schley, Frank Schmidt, Frank Sobel, Markus Renno, Nathalie Olschewski, Holger Seitz, Ute Buttgereit, Konrad Knapp, Guenter Hess
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570217
KEYWORDS: Inspection, Etching, Tantalum, Phase shifts, Dry etching, Lithography, Oxides, Silica, Reflection, Mask cleaning

Proceedings Article | 20 August 2004 Paper
Hans Becker, Frank Schmidt, Frank Sobel, Markus Renno, Ute Buttgereit, Jay Chey, Marie Angelopoulos, Konrad Knapp, Gunter Hess
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557798
KEYWORDS: Particles, Phase shifts, Silica, Lithography, Etching, Photomasks, Tantalum, Surface roughness, Scanning electron microscopy, Deposition processes

Proceedings Article | 2 June 2004 Paper
Lutz Aschke, Hans Becker, Falk Friemel, Thomas Leutbecher, Nathalie Olschewski, Markus Renno, Frauke Rueggeberg, Mario Schiffler, Frank Schmidt, Frank Sobel, Kurt Walter, Guenter Hess, Frank Lenzen, Konrad Knapp, Jochen Alkemper, Hrabanus Hack, Klaus Megges, Ina Mitra, Rolf Mueller, Uwe Nolte, Joerg Schumacher, Wolfgang Pannhorst
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568007
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Zerodur, Reflectivity, Polishing, Temperature metrology, Surface finishing, Glasses

Proceedings Article | 2 June 2004 Paper
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568004
KEYWORDS: Reticles, Photomasks, Mask making, Semiconducting wafers, Microelectronics, Optical alignment, Chromium, Glasses, Printing, Optical lithography

Proceedings Article | 20 May 2004 Paper
Frank Sobel, Lutz Aschke, Frauke Rueggeberg, Holger Seitz, Nathalie Olschewski, Torsten Reichhardt, Hans Becker, Markus Renno, Steffen Kirchner, Thomas Leutbecher, Guenter Hess, Konrad Knapp
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533292
KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet lithography, Polishing, Extreme ultraviolet, Surface finishing, Magnetorheological finishing, Surface roughness, Silica, Optical coatings

Proceedings Article | 17 December 2003 Paper
Hans Becker, Jay Chey, Frank Sobel, Frank Schmidt, Markus Renno, Ute Buttgereit, Marie Angelopoulos, Guenter Hess, Konrad Knapp
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518339
KEYWORDS: Phase shifts, Particles, Tantalum, Phase shifting, Lithography, Photomasks, Chemical lasers, Laser stabilization, Vacuum ultraviolet, Ion beams

Proceedings Article | 17 December 2003 Paper
Frank Sobel, Lutz Aschke, Hans Becker, Markus Renno, Frauke Ruggeberg, Steffen Kirchner, Thomas Leutbecher, Nathalie Olschewski, Mario Schiffler, Kurt Walter, Guenter Hess, Ute Buttgereit, Konrad Knapp, Rainer Lebert, Larissa Juschkin, Christian Wies, Bernhard Jagle
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518061
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Coating, Reflectivity, Polishing, Reflectometry, Surface finishing, Metrology

Proceedings Article | 4 November 2003 Paper
Axel Engel, Hans-Juergen Becker, Oliver Sohr, Rainer Haspel, Volker Rupertus
Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.506814
KEYWORDS: Absorption, Luminescence, Glasses, Surface finishing, Metrology, Fluorescence spectroscopy, Lamps, Lithography, Ultraviolet radiation, Spectroscopy

Proceedings Article | 28 May 2003 Paper
Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515064
KEYWORDS: Photomasks, Reticles, Mask making, Photography, Integrated circuits, Microscopes, Semiconducting wafers, Cameras, Transistors, Microelectronics

Proceedings Article | 27 December 2002 Paper
Hans Becker, Frank Sobel, Lutz Aschke, Markus Renno, Juergen Krieger, Ute Buttgereit, Guenter Hess, Frank Lenzen, Konrad Knapp, Sergey Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467578
KEYWORDS: Reflectivity, Multilayers, Particles, Extreme ultraviolet, Ion beams, Transmission electron microscopy, Silicon, Sputter deposition, Interfaces, Reflectometry

Proceedings Article | 1 July 2002 Paper
Hans Becker, Lutz Aschke, Birgit Schubert, Juergen Krieger, Frank Lenzen, Sergey Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472326
KEYWORDS: Multilayers, Extreme ultraviolet, Ion beams, Reflectivity, Transmission electron microscopy, Molybdenum, Interfaces, Atomic force microscopy, Reflection, Sputter deposition

Proceedings Article | 4 November 1994 Paper
Proceedings Volume 2253, (1994) https://doi.org/10.1117/12.192102
KEYWORDS: Absorption, Calorimetry, Temperature metrology, Convection, Argon ion lasers, Silica, Numerical simulations, Laser development, Coating, Carbon dioxide lasers

Showing 5 of 22 publications
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