Mr. Henry Carl Herbol Profile

Henry Carl Herbol

Doctoral Candidate at Cornell Univ

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Author

Publications (6)

SPIE Journal Paper | 13 October 2015

Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling

Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Jonathon Schad, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard

JM3, Vol. 14, Issue 04, 043502, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043502

KEYWORDS: Extreme ultraviolet, Scattering, Electron beams, Extreme ultraviolet lithography, Photons, Photoresist materials, Ionization, Ellipsometry, Monte Carlo methods, Solid modeling

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SPIE Journal Paper | 15 May 2015 Open Access

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas Pistor, Gregory Denbeaux

JM3, Vol. 14, Issue 02, 023505, (May 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.023505

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

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Proceedings Article | 16 March 2015 Paper

Studying secondary electron behavior in EUV resists using experimentation and modeling

Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard

Proceedings Volume 9422, 942208 (2015) https://doi.org/10.1117/12.2086596

KEYWORDS: Photons, Scattering, Extreme ultraviolet lithography, Ionization, Extreme ultraviolet, Photoresist materials, Monte Carlo methods, Ellipsometry, Lithography, Polymers

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Proceedings Article | 16 March 2015 Paper

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Proceedings Volume 9422, 94220Q (2015) https://doi.org/10.1117/12.2175842

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Chemical species, Extreme ultraviolet lithography, Inspection, Monte Carlo methods, Computer simulations, Waveguides, Transmission electron microscopy

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Proceedings Article | 17 April 2014 Paper

Investigating printability of native defects on EUV mask blanks through simulations and experiments

Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Il-Yong Jang, Hyuk Joo Kwon, Jenah Harris-Jones, Gregory Denbeaux

Proceedings Volume 9048, 90483L (2014) https://doi.org/10.1117/12.2057761

KEYWORDS: Finite-difference time-domain method, Photomasks, Chemical species, Transmission electron microscopy, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Atomic force microscopy, Inspection

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Proceedings Article | 23 March 2012 Paper

Developing particle detection test bench for vacuum components

Yashdeep Khopkar, Henry Herbol, Mihir Upadhyaya, Gregory Denbeaux, Vibhu Jindal, Patrick Kearney

Proceedings Volume 8322, 832225 (2012) https://doi.org/10.1117/12.919689

KEYWORDS: Particles, Optical proximity correction, Photomasks, Compound parabolic concentrators, Atmospheric particles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Scanning electron microscopy, Detector development

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Showing 5 of 6 publications

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