Dr. Leonidas E. Ocola Profile

Dr. Leonidas E. Ocola

Physicist at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 9 April 2024 Presentation + Paper

Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas

Juliano Borges, Hongwen Yan, Devi Koty, Sophia Rogalskyj, Lynne Gignac, Leonidas Ocola, Marinus Hopstaken, Steve Molis, Andrew Simon, John Arnold, Jeffrey Shearer, Robert Bruce

Proceedings Volume 12958, 129580E (2024) https://doi.org/10.1117/12.3010015

KEYWORDS: Etching, Plasmas, Mixtures, Argon, Iridium, Chlorine, Chemistry, Thin films, Silicon

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Proceedings Article | 3 January 2020 Paper

Photonic ring resonator notch filters for astronomical OH line suppression

P. Liu, S. Kuhlmann, S. Ellis, K. Kuehn, H. Spinka, D. Underwood, L. Ocola, R. Gupta, N. Stern

Proceedings Volume 11203, 112030Y (2020) https://doi.org/10.1117/12.2539772

KEYWORDS: Resonators, Linear filtering, Astronomy, Waveguides, Finite-difference time-domain method, Roads, Signal attenuation, Electron beams, Observatories, Physics

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Proceedings Article | 2 January 2018 Paper

Photonic ring resonator notch filters for astronomical OH suppression

S. Kuhlmann, P. Liu, S. Ellis, K. Kuehn, H. Spinka, D. Underwood, L. Ocola, R. Gupta, N. Stern

Proceedings Volume 10456, 104564B (2018) https://doi.org/10.1117/12.2283353

KEYWORDS: Resonators, Silicon, Waveguides, Semiconducting wafers, Astronomy, Near infrared, Space telescopes, Electron beams, Linear filtering, Polarization

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Proceedings Article | 17 May 2017 Presentation + Paper

Astrophotonics: the application of photonic technology to astronomy

S. Ellis, S. Kuhlmann, K. Kuehn, H. Spinka, D. Underwood, R. Gupta, L. Ocola, P. Liu, G. Wei, N. Stern, J. Bland-Hawthorn, P. Tuthill

Proceedings Volume 10242, 102420O (2017) https://doi.org/10.1117/12.2265958

KEYWORDS: Resonators, Silicon, Optical interferometry, Phase shifts, Astrophotonics, Astronomy, Waveguides, Astronomical instrumentation, Optical filters, Planar waveguides, Integrated optics

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Proceedings Article | 25 March 2016 Paper

Studying electron-PAG interactions using electron-induced fluorescence

Amrit Narasimhan, Steven Grzeskowiak, Jonathan Ostrander, Jonathon Schad, Eliran Rebeyev, Mark Neisser, Leonidas Ocola, Gregory Denbeaux, Robert Brainard

Proceedings Volume 9779, 97790F (2016) https://doi.org/10.1117/12.2219850

KEYWORDS: Electrons, Luminescence, Extreme ultraviolet lithography, Extreme ultraviolet, Molecules, Photons, Lithography, Photoresist materials, Ionization, Molecular interactions, Polymers, Photodiodes, Polymethylmethacrylate, Phase modulation, Quantum efficiency

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Proceedings Article | 21 March 2016 Paper

Cross sections of EUV PAGs: influence of concentration, electron energy, and structure

Steven Grzeskowiak, Amrit Narasimhan, Liam Wisehart, Jonathon Schad, Mark Neisser, Leonidas Ocola, Robert Brainard, Greg Denbeaux

Proceedings Volume 9779, 97790C (2016) https://doi.org/10.1117/12.2219851

KEYWORDS: Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photochemistry, Ionization, Chemically amplified resists, Mass spectrometry, Electron beams, Absorption, Polymers, Molecular interactions

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Proceedings Article | 18 March 2016 Paper

Energy deposition and charging in EUV lithography: Monte Carlo studies

Liam Wiseheart, Amrit Narasimhan, Steven Grzeskowiak, Mark Neisser, Leonidas Ocola, Greg Denbeaux, Robert Brainard

Proceedings Volume 9776, 97762O (2016) https://doi.org/10.1117/12.2219849

KEYWORDS: Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Solid modeling, Photons, Ionization, Copper, Silicon, Particles

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Proceedings Article | 13 February 2016 Paper

Photoluminescence of sequential infiltration synthesized ZnO nanostructures

Leonidas Ocola, David Gosztola, Angel Yanguas-Gil, Hyo-Seon Suh, Aine Connolly

Proceedings Volume 9755, 97552C (2016) https://doi.org/10.1117/12.2209422

KEYWORDS: Zinc oxide, Polymethylmethacrylate, Luminescence, Oxides, Quantum dots, Atomic layer deposition, Silicon, Oxygen, Photonics, Etching, Polymers, Polymer thin films

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SPIE Journal Paper | 13 October 2015

Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling

Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Jonathon Schad, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard

JM3, Vol. 14, Issue 04, 043502, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043502

KEYWORDS: Extreme ultraviolet, Scattering, Electron beams, Extreme ultraviolet lithography, Photons, Photoresist materials, Ionization, Ellipsometry, Monte Carlo methods, Solid modeling

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Proceedings Article | 19 March 2015 Paper

Metrology of DSA process using TEM tomography

Tamar Segal-Peretz, Jonathan Winterstein, Jiaxing Ren, Mahua Biswas, J. Alexander Liddle, Jeffery Elam, Leonidas Ocola, Ralu N. Divan, Nestor Zaluzec, Paul Nealey

Proceedings Volume 9424, 94240U (2015) https://doi.org/10.1117/12.2085577

KEYWORDS: Tomography, Nanostructures, Transmission electron microscopy, Scanning transmission electron microscopy, Polymers, Polymethylmethacrylate, Etching, Metrology, Picosecond phenomena, Directed self assembly

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Proceedings Article | 16 March 2015 Paper

Studying secondary electron behavior in EUV resists using experimentation and modeling

Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard

Proceedings Volume 9422, 942208 (2015) https://doi.org/10.1117/12.2086596

KEYWORDS: Photons, Scattering, Extreme ultraviolet lithography, Ionization, Extreme ultraviolet, Photoresist materials, Monte Carlo methods, Ellipsometry, Lithography, Polymers

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Proceedings Article | 17 August 2014 Paper

Highly tunable ultra-narrow-resonances with optical nano-antenna phased arrays in the infrared

Shi-Qiang Li, Wei Zhou, Peijun Guo, D. Bruce Buchholz, Ziwei Qiu, John Ketterson, Leonidas Ocola, Kazuaki Sakoda, Robert P. Chang

Proceedings Volume 9163, 91630R (2014) https://doi.org/10.1117/12.2061430

KEYWORDS: Plasmonics, Phased array optics, Infrared radiation, Phased arrays, Photonics, Antennas, Neodymium, Polarization, Particles, Nanorods

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Proceedings Article | 11 September 2013 Paper

TCO Nanostructures as building blocks for nanophotonic devices in the infrared

Shi Qiang Li, Robert Chang, Leonidas Ocola

Proceedings Volume 8809, 880928 (2013) https://doi.org/10.1117/12.2025289

KEYWORDS: Oxygen, Nanostructures, Infrared radiation, Crystals, Polarization, Transmission electron microscopy, Transparent conductors, Nanophotonics, Nanowires, Nanorods

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Proceedings Article | 23 February 2011 Paper

Hexagonal photonic crystal waveguide based on barium titanate thin films

Jianheng Li, Zhifu Liu, Bruce Wessels, Yongming Tu, Seng-Tiong Ho, Alexandra Joshi-Imre, Leonidas Ocola

Proceedings Volume 7934, 79340R (2011) https://doi.org/10.1117/12.875072

KEYWORDS: Optical microcavities, Ferroelectric materials, Waveguides, Refractive index, Transmittance, Photonic crystals, Geometrical optics, Modulators, Thin films, Finite-difference time-domain method

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Proceedings Article | 10 September 2008 Paper

Fabrication of high-aspect-ratio hard x-ray zone plates with HSQ plating molds

Ming Lu, Leonidas Ocola, Ralu Divan, Derrick Mancini

Proceedings Volume 7039, 70390V (2008) https://doi.org/10.1117/12.796839

KEYWORDS: Zone plates, Gold, Electron beam lithography, Plating, Hard x-rays, X-rays, Photoresist processing, Reactive ion etching, Electroplating, Etching

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Proceedings Article | 19 January 2005 Paper

From microchannels to nanochannels in a bilayer resist

Leonidas Ocola, Aaron Stein

Proceedings Volume 5592, (2005) https://doi.org/10.1117/12.572068

KEYWORDS: Diffusion, Photoresist processing, Photoresist materials, Polymers, Photomicroscopy, Plasma etching, Plasma, Electron beam lithography, Scanning electron microscopy, Nanomaterials

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Proceedings Article | 4 November 2004 Paper

Tapered tilted linear zone plates for focusing hard x-rays

Leonidas Ocola, Joerg Maser, Stefan Vogt, Barry Lai, Ralu Divan, Gregory Stephenson

Proceedings Volume 5539, (2004) https://doi.org/10.1117/12.559772

KEYWORDS: Zone plates, Data transmission, Hard x-rays, X-rays, Imaging spectroscopy, X-ray optics, X-ray diffraction, X-ray imaging, Gold, Lithography

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Proceedings Article | 16 June 2003 Paper

Software tool for advanced Monte Carlo simulation of electron scattering in EBL and SEM: CHARIOT

Sergey Babin, S. Borisov, E. Cheremukhin, Eugene Grachev, V. Korol, L. Ocola

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504568

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Sensors, Signal detection, Scattering, Electron beam lithography, Plasmons, Software development, Energy transfer, Semiconducting wafers

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Proceedings Article | 21 July 2000 Paper

Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure

Leonidas Ocola, Myrtle Blakey, Paul Orphanos, Wai-Yi Li, Anthony Novembre, Robert Brainard, Joseph Mackevich, Gary Taylor

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390055

KEYWORDS: Charged-particle lithography, Deep ultraviolet, Monte Carlo methods, Absorption, Electrons, Polymers, Chemically amplified resists, Lithography, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 25 June 1999 Paper

Development of a technique for rapid at-wavelength inspection of EUV mask blanks

Steven Spector, Ping Luo, Anthony Novembre, Leonidas Ocola, Donald White, Donald Tennant, Obert Wood

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351134

KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Contamination, Photoresist materials, Floods, Multilayers, Semiconducting wafers

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Proceedings Article | 25 June 1999 Paper

Resist characteristics with direct-write electron beam and SCALPEL exposure system

Mitsuru Sato, Katsumi Omori, Kiyoshi Ishikawa, Toshimasa Nakayama, Anthony Novembre, Leonidas Ocola

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351094

KEYWORDS: Charged-particle lithography, Electron beams, Electron beam lithography, Lithography, Critical dimension metrology, Standards development, Optical lithography, Photoresist materials, Light sources, Semiconducting wafers

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Proceedings Article | 25 June 1999 Paper

Alignment mark detection in CMOS materials with SCALPEL e-beam lithography

Reginald Farrow, Warren Waskiewicz, Isik Kizilyalli, Gregg Gallatin, James Liddle, Masis Mkrtchyan, Avi Kornblit, Leonidas Ocola, Fred Klemens, Joseph Felker, Christopher Biddick, Joseph Kraus, Myrtle Blakey, Paul Orphanos, Nace Layadi, Sailesh Merchant

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351093

KEYWORDS: Charged-particle lithography, Semiconducting wafers, Optical alignment, Signal detection, Lithography, Photomasks, Signal to noise ratio, Electron beam lithography, CMOS sensors, Scanning electron microscopy

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Proceedings Article | 15 September 1993 Paper

Prebake and post-exposure bake effects on the dissolution of AZ-PF

Azalia Krasnoperova, Michael Reilly, S. Turner, L. Ocola, Franco Cerrina

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154767

KEYWORDS: Semiconducting wafers, Chemically amplified resists, Polymers, Photoresist processing, Silver, Optical lithography, Silicon, Chlorine, X-ray lithography, Surface roughness

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