Dr. Huirong Yao Profile

Dr. Huirong Yao

Senior Research Chemist at EMD Electronics

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Publications (11)

Proceedings Article | 7 April 2017 Paper

Spin-on metal oxide materials for N7 and beyond patterning applications

G. Mannaert, E. Altamirano-Sanchez, T. Hopf, F. Sebaai, C. Lorant, C. Petermann, S.-E. Hong, S. Mullen, E. Wolfer, D. Mckenzie, H. Yao, D. Rahman, J.-Y. Cho, M. Padmanaban, D. Piumi

Proceedings Volume 10149, 101490T (2017) https://doi.org/10.1117/12.2264323

KEYWORDS: Etching, Metals, Optical lithography, Photomasks, Plasma, System on a chip, Oxides, Contamination, Reflectivity, Silicon

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Proceedings Article | 25 March 2016 Paper

Spin-on metal oxide materials with high etch selectivity and wet strippability

Huirong Yao, Salem Mullen, Elizabeth Wolfer, Douglas McKenzie, Dalil Rahman, JoonYeon Cho, Munirathna Padmanaban, Claire Petermann, SungEun Hong, YoungJun Her

Proceedings Volume 9779, 97791O (2016) https://doi.org/10.1117/12.2220293

KEYWORDS: Resistance, Oxygen, Silicon, Semiconducting wafers

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Proceedings Article | 20 March 2015 Paper

Progress in spin-on metal oxide hardmask materials for filling applications

Huirong Yao, Alberto Dioses, Salem Mullen, Elizabeth Wolfer, Douglas McKenzie, Dalil Rahman, JoonYeon Cho, Munirathna Padmanaban, Claire Petermann, YoungJun Her, Yi Cao

Proceedings Volume 9425, 942518 (2015) https://doi.org/10.1117/12.2085811

KEYWORDS: Metals, Etching, Oxides, Photomasks, Dielectrics, Resistance, Semiconducting wafers, Coating, Silicon, Plasma etching

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Proceedings Article | 27 March 2014 Paper

Novel spin-on metal hardmask materials for filling applications

Alberto Dioses, Venkata Chada, Elizabeth Wolfer, Edward Ng, Salem Mullen, Huirong Yao, JoonYeon Cho, Munirathna Padmanaban

Proceedings Volume 9051, 90512B (2014) https://doi.org/10.1117/12.2046676

KEYWORDS: Etching, Resistance, Metals, Chemical vapor deposition, Semiconducting wafers, Silicon, Wet etching, Atomic layer deposition, Oxides, Semiconductor manufacturing

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Proceedings Article | 27 March 2014 Paper

A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

Jin Li, Ide Yasuaki, Shigemasa Nakasugi, Motoki Misumi, Hiroshi Yanagita, Fumihiro Suzuki, Georg Pawlowski, JoonYeon Cho, Huirong Yao, Takanori Kudo, Munirathna Padmanaban, YoungJun Her, Yi Cao

Proceedings Volume 9051, 905117 (2014) https://doi.org/10.1117/12.2046237

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photons, Electrons, Optical lithography, Lithography, Printing, Polymers, Photomasks, Absorbance

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Proceedings Article | 29 March 2013 Paper

Underlayer and rinse materials for improving EUV resist performance

Munirathna Padmanaban, JoonYeon Cho, Takanori Kudo, Salem Mullen, Huirong Yao, Go Noya, Yuriko Matsuura, Yasuaki Ide, Jin Li, Georg Pawlowski

Proceedings Volume 8682, 868215 (2013) https://doi.org/10.1117/12.2013363

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Line width roughness, Semiconducting wafers, Extreme ultraviolet lithography, Polymers, Coating, Absorption, Etching, Photoresist materials

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Proceedings Article | 29 March 2013 Paper

New spin-on metal hardmask materials for lithography processes

Huirong Yao, Salem Mullen, Elizabeth Wolfer, Dalil Rahman, Clement Anyadiegwu, Douglas Mckenzie, Alberto Dioses, Joonyeon Cho, Munirathna Padmanaban

Proceedings Volume 8682, 86820S (2013) https://doi.org/10.1117/12.2011226

KEYWORDS: Etching, Metals, Semiconducting wafers, Photomasks, Silicon, Coating, Oxides, Extreme ultraviolet lithography, Lithography, Photoresist materials

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Proceedings Article | 16 April 2011 Paper

EUV underlayer materials for 22nm HP and beyond

Huirong Yao, Zachary Bogusz, Jianhui Shan, Joonyeon Cho, Salem Mullen, Guanyang Lin, Mark Neisser

Proceedings Volume 7972, 797212 (2011) https://doi.org/10.1117/12.881639

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography, Absorption, Line width roughness, Semiconducting wafers, Lithography, Polymers, Etching, Contamination

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Proceedings Article | 4 December 2008 Paper

Bottom anti-reflective coating for hyper NA process: theory, application and material development

Huirong Yao, JoonYeon Cho, Jian Yin, Salem Mullen, Guanyang Lin, Mark Neisser, Ralph Dammel

Proceedings Volume 7140, 71402X (2008) https://doi.org/10.1117/12.804617

KEYWORDS: Absorption, Polymers, Lithography, Absorbance, Refractive index, Reflectivity, Etching, Bottom antireflective coatings, Immersion lithography, Antireflective coatings

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Proceedings Article | 15 April 2008 Paper

High-etch-rate low-bias bow outgassing BARC via-filling materials for 193-nm ArF lithographic process

Huirong Yao, Zhong Xiang, Salem Mullen, Jian Yin, Walter Liu, Jianhui Shan, Elleazar Gonzalez, Guanyang Lin, Mark Neisser

Proceedings Volume 6923, 69232J (2008) https://doi.org/10.1117/12.773400

KEYWORDS: Etching, Lithography, Polymers, Reflectivity, Semiconducting wafers, Coating, Immersion lithography, Chromophores, Scanning electron microscopy, Bottom antireflective coatings

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Proceedings Article | 6 April 2007 Paper

Organic ArF bottom anti-reflective coatings for immersion lithography

Zhong Xiang, Hong Zhuang, Hengpeng Wu, Jianhui Shan, Dave Abdallah, Jian Yin, Salem Mullen, Huirong Yao, Eleazar Gonzalez, Mark Neisser

Proceedings Volume 6519, 651929 (2007) https://doi.org/10.1117/12.710669

KEYWORDS: Etching, Reflectivity, Immersion lithography, Photomasks, Chemical vapor deposition, Lithography, Bottom antireflective coatings, Semiconducting wafers, Control systems, Signal attenuation

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Showing 5 of 11 publications

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