Dr. Jennifer Church Profile

Dr. Jennifer Church

SPIE Involvement:

Conference Program Committee | Author

Area of Expertise:

EUV Lithography , Advanced Patterning

Profile Summary

I started at IBM in 2018 as a lithography engineer. My area of expertise is in EUV patterning and characterization - with a focus on EUV stochastics. I develop and apply various characterization methods to understand the modulation of stochastic events by different processes and materials.

Publications (19)

Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

EUV patterned gate variation reduction in next generation transistor architectures

Gopal Sankar Kenath, Martin Burkhardt, Nikhil Jain, Anna Lin, Jennifer Church, Gen Tsutsui, Stephanie Reynoso, Xuan Liu, Chris Sheraw, Pietro Montanini, Eric Miller, Indira Seshadri, Luciana Meli, Nelson Felix

Proceedings Volume 12953, 1295305 (2024) https://doi.org/10.1117/12.3012023

KEYWORDS: Line width roughness, Light sources and illumination, Nanoimprint lithography, Optical lithography, Line edge roughness, Etching, Transistors, Extreme ultraviolet, Reactive ion etching, Extreme ultraviolet lithography

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Proceedings Article | 30 April 2023 Presentation

Presentation

Measurement and analysis of variations in via measurements using critical dimension scanning electron microscopes and e-beam massive metrology techniques

Genevieve Kane, Jennifer Church, Connor Franzese, Chris Mack, Cody Murray, Luciana Meli

Proceedings Volume 12496, 124960V (2023) https://doi.org/10.1117/12.2657650

KEYWORDS: Metrology, Scanning electron microscopy, Electron microscopes, Extreme ultraviolet, Time metrology, Stochastic processes, Statistical analysis, Critical dimension metrology, Inspection

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Proceedings Article | 13 June 2022 Presentation

Presentation

Resist shrink characterization methodology for more accurate CD metrology

Mary Breton, Karen Petrillo, Jennifer Church, Luciana Meli, Jennifer Fullam, Stuart Sieg, Romain Lallement, Nelson Felix, Shimon Levi, Susan Zollinger, Felix Levitov, Sean Hand, Jason Osborne, Weijie Wang

Proceedings Volume PC12053, PC120530C (2022) https://doi.org/10.1117/12.2614219

KEYWORDS: Critical dimension metrology, Metrology, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Process modeling, Data modeling, Photomasks, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 26 May 2022 Presentation + Paper

Presentation + Paper

Throughput vs. yield: reviewing the metrology needs for stochastics-aware process window analysis (SA-PWA)

Jennifer Church, Luciana Meli

Proceedings Volume 12053, 1205306 (2022) https://doi.org/10.1117/12.2613102

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Metrology, Line width roughness, Etching, Line edge roughness, Critical dimension metrology, Yield improvement, Photomasks

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Proceedings Article | 17 November 2021 Presentation + Paper

Presentation + Paper

Exploring the stochastics cliff: understanding the impact of LER/LWR to stochastic defectivity and yield

Jennifer Church, Graham Jensen, Romain Lallement, Andrew Cross, Luciana Meli

Proceedings Volume 11854, 118540X (2021) https://doi.org/10.1117/12.2600877

KEYWORDS: Line edge roughness, Stochastic processes, Inspection, Modulation, Critical dimension metrology, Semiconducting wafers, Plasma, Defect inspection, Optical inspection, Extreme ultraviolet lithography

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Proceedings Article | 26 February 2021 Presentation + Paper

Presentation + Paper

Contact local CD uniformity optimization through etch shrink

Eric Miller, Junling Sun, Jennifer Church, Xinghua Sun, Angelique Raley

Proceedings Volume 11615, 116150A (2021) https://doi.org/10.1117/12.2583666

KEYWORDS: Etching, Critical dimension metrology, Optical lithography, Back end of line, Semiconducting wafers, Logic, Lithography, Dielectrics

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Proceedings Article | 24 February 2021 Presentation + Paper

Presentation + Paper

EUV single exposure via patterning at aggressive pitch

Jing Guo, Jennifer Church, Luciana Meli, Anuja de Silva, Martin Burkhardt, Karen Petrillo, Mary Breton, Cody Murray, Lijuan Zou, Allen Gabor, Nelson Felix

Proceedings Volume 11609, 116090U (2021) https://doi.org/10.1117/12.2582563

KEYWORDS: Optical lithography, Etching, Stochastic processes, Semiconducting wafers, Resolution enhancement technologies, Extreme ultraviolet lithography, Scanners, Inspection, Source mask optimization, Photoresist processing

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Proceedings Article | 22 February 2021 Presentation

Presentation

Nanosheet metrology opportunities for technology readiness

Mary Breton, Daniel Schmidt, Andrew Greene, Julien Frougier, Curtis Durfee, Indira Seshadri, Jennifer Church, Veeraraghavan Basker, Nelson Felix

Proceedings Volume 11611, 116111R (2021) https://doi.org/10.1117/12.2583636

KEYWORDS: Metrology, Line edge roughness, Gallium arsenide, Transistors, Semiconductors, Nondestructive evaluation, Nanotechnology, Manufacturing, Machine learning, Logic

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Proceedings Article | 22 February 2021 Presentation

Presentation

Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets

Indira Seshadri, Jennifer Church, Prateek Hundekar, Mary Breton, Jingyun Zhang, Eric Miller, Andrew Greene, Julien Frougier, Chris Waskiewicz, Tao Li, Tsung-Sheng Kang, Daniel Dechene, Carl Radens, Stuart Sieg, Veeraraghavan Basker, Nelson Felix, Chris Mack

Proceedings Volume 11609, 116090S (2021) https://doi.org/10.1117/12.2583897

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Proceedings Article | 22 February 2021 Presentation

Presentation

The road towards aggressive pitch scaling with single exposure EUV

Luciana Meli, Jennifer Church, Anuja De Silva, Karen Petrillo, Dario Goldfarb, Stuart Sieg, Romain Lallement, Dallas Lea, Martin Burkhardt, Nelson Felix, Cody Murray

Proceedings Volume 11609, 116090P (2021) https://doi.org/10.1117/12.2583566

KEYWORDS: Extreme ultraviolet lithography, Roads, Extreme ultraviolet, Optical lithography, Yield improvement, Transistors, Printing, Modulation, Metals, Materials processing

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SPIE Journal Paper | 1 July 2020 Open Access

Open Access

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Jennifer Church, Luciana Meli, Jing Guo, Martin Burkhardt, Chris Mack, Anuja De Silva, Karen Petrillo, Mary Breton, Ravi Bonam, Romain Lallement, Eric Miller, Brad Austin, Shravan Matham, Nelson Felix

JM3, Vol. 19, Issue 03, 034001, (July 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.034001

KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

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Proceedings Article | 4 May 2020 Presentation + Paper

Presentation + Paper

Measuring local CD uniformity in EUV vias with scatterometry and machine learning

Dexin Kong, Daniel Schmidt, Jennifer Church, Chi-Chun Liu, Mary Breton, Cody Murray, Eric Miller, Luciana Meli, John Sporre, Nelson Felix, Ishtiaq Ahsan, Aron Cepler, Marjorie Cheng, Roy Koret, Igor Turovets

Proceedings Volume 11325, 113251I (2020) https://doi.org/10.1117/12.2551498

KEYWORDS: Scatterometry, Machine learning, Semiconducting wafers, Critical dimension metrology, Etching, Photoresist materials, Lithography, Metrology, Scatter measurement, Data modeling

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Proceedings Article | 6 April 2020 Presentation + Paper

Presentation + Paper

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee, Brendan O’Brien, Luciana Meli, Chi Chun Liu, Saumya Sharma, Karen Petrillo, Cody Murray, Eric Liu, Katie Lutker-Lee, Qiaowei Lou, Chris Cole, Angélique Raley, Akiteru Ko, Subhadeep Kal, Jake Kaminsky, Aelan Mosden, Henan Zhang, Shan Hu, Lior Huli, Naoki Shibata, Dave Hetzer, Chia-Yun (Sharon) Hsieh

Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727

KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

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Proceedings Article | 24 March 2020 Presentation

Presentation

High-Z metal-based underlayer patterning for improving EUV stochastics (Conference Presentation)

Anuja De Silva, Jennifer Church, Dominik Metzler, Luciana Meli, Nelson Felix, Phil Friddle, Bhaskar Nagabhirava, Siva Kanakasabapathy, Rich Wise

Proceedings Volume 11323, 113230M (2020) https://doi.org/10.1117/12.2551319

KEYWORDS: Optical lithography, Stochastic processes, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist materials, Photoresist developing, Lithography, Interfaces, Absorbance

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Proceedings Article | 24 March 2020 Presentation

Presentation

Exploration of pillar local CDU improvement options for AI applications (Conference Presentation)

Chi-Chun Liu, Hao Tang, Yann Mignot, Ashim Dutta, Jennifer Church, Saumya Sharma, Dominik Metzler, Karen Petrillo, Michael Rizzolo, Luciana Meli, John Arnold, Nelson Felix

Proceedings Volume 11326, 113260W (2020) https://doi.org/10.1117/12.2552112

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Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch

Jennifer Church, Luciana Meli, Jing Guo, Martin Burkhardt, Chris Mack, Anuja DeSilva, Karen Petrillo, Mary Breton, Ravi Bonam, Romain Lallement, Eric Miller, Brad Austin, Shravan Matham, Nelson Felix

Proceedings Volume 11323, 113230O (2020) https://doi.org/10.1117/12.2551487

KEYWORDS: Stochastic processes, Line edge roughness, Inspection, Defect inspection, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Etching, Bridges

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Proceedings Article | 16 October 2019 Presentation

Presentation

High-Z metal-based underlayer to improve EUV stochastics (Conference Presentation)

Anuja De Silva, Jennifer Church Church, Dominik Metzler, Luciana Meli, Phil Friddle, Bhaskar Nagabhirava, Rich Wise, Nader Shamma

Proceedings Volume 11147, 111470W (2019) https://doi.org/10.1117/12.2539272

KEYWORDS: Stochastic processes, Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Photoresist materials, Etching, Photoresist developing, Lithography, Interfaces, Absorbance

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Proceedings Article | 16 October 2019 Presentation

Presentation

Approaches to modulating stochastic effects in EUV lithography (Conference Presentation)

Luciana Meli, Anuja De Silva, Dario Goldfarb, Jennifer Church, Martin Burkhardt, Chris Robinson, Mary Breton, Nelson Felix

Proceedings Volume 11147, 1114718 (2019) https://doi.org/10.1117/12.2539037

KEYWORDS: Stochastic processes, Modulation, Extreme ultraviolet lithography, Optical lithography, Image resolution, Photomasks, Etching, Extreme ultraviolet, Line edge roughness

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Proceedings Article | 26 March 2019 Presentation + Paper

Presentation + Paper

Investigation of mask absorber induced image shift in EUV lithography

Martin Burkhardt, Anuja De Silva, Jennifer Church, Luciana Meli, Chris Robinson, Nelson Felix

Proceedings Volume 10957, 1095710 (2019) https://doi.org/10.1117/12.2515365

KEYWORDS: Phase shifts, Extreme ultraviolet lithography, Palladium, Phase shifting, Extreme ultraviolet, Nickel, Photomasks, Lithography, Lithographic illumination, Defect inspection

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Showing 5 of 19 publications

Conference Committee Involvement (2)

International Conference on Extreme Ultraviolet Lithography 2024

30 September 2024 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

Course Instructor

NON-SPIE: Advisory Engineer

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