Dr. Jiahao Xi Profile

Dr. Jiahao Xi

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Publications (5)

Proceedings Article | 10 December 2024 Paper

The implementation of overlay compensation between multiple photo layers generated by a single mask

Hao Yang, Di Liang, Yuxing Zhou, Jiahao Xi, Enqiang Tian, Ganlin Song, Mingyi Yao, Jiangliu Shi, Miao Jiang

Proceedings Volume 13423, 134230N (2024) https://doi.org/10.1117/12.3052904

KEYWORDS: Overlay metrology, Semiconducting wafers, Photomasks, Modeling, Failure analysis

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Proceedings Article | 10 December 2024 Paper

A study of aerial image NILS and exposure energy as improvement factors for LER

Di Liang, Hao Yang, Yufei Sha, Yuxing Zhou, Jiahao Xi, Enqiang Tian, Cuixiang Wang, Ganlin Song, Xiaohong Zhao, Jiangliu Shi, Miao Jiang

Proceedings Volume 13423, 134230M (2024) https://doi.org/10.1117/12.3052903

KEYWORDS: Line edge roughness, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Lithography

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Proceedings Article | 10 December 2024 Paper

Multilayer reticle heating impact on product overlay

Yuxing Zhou, Guangying Zhou, Mingyi Yao, Di Liang, Jiahao Xi, Ganlin Song, Xiuyan Cheng, Miao Jiang, Jiangliu Shi

Proceedings Volume 13423, 134230K (2024) https://doi.org/10.1117/12.3052900

KEYWORDS: Reticles, Semiconducting wafers, Overlay metrology, Lithography, Scanners

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Proceedings Article | 12 November 2024 Poster + Paper

Contour-based mask quantization methodology for curvilinear ILT mask and on wafer performance analysis

Futian Wang, Xiaonan Liu, Juan Wei, Miao Jiang, Cuixiang Wang, Yu Mu, Enqiang Tian, Yaokun Li, Song Sun, Ruihua Liu, Jiahao Xi, Yufei Sha, Di Liang, Hao Yang, Qingchen Cao, Jiangliu Shi

Proceedings Volume 13216, 132161Z (2024) https://doi.org/10.1117/12.3034016

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Manufacturing, SRAF, Critical dimension metrology, Contour extraction, Optical proximity correction, Error analysis, Quantization, Lithography

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Proceedings Article | 10 April 2024 Poster + Paper

Photoresist process simulation to study line edge roughness

Yufei Sha, Shuxin Yao, Miao Jiang, Hao Yang, Di Liang, Cuixiang Wang, Futian Wang, Enqiang Tian, Jiahao Xi, Yulong Jiang, Jiangliu Shi

Proceedings Volume 12953, 1295317 (2024) https://doi.org/10.1117/12.3010734

KEYWORDS: Photoresist materials, Line edge roughness, Quenching, Photoresist developing, Diffusion, Polymers, Acid diffusion length, Photoacid generators, Lithography, Line width roughness

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