Ms. Yu Mu Profile

Yu Mu

at Beijing Superstring Academy of Memory Technology

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Author

Publications (5)

Proceedings Article | 20 November 2024 Poster + Paper

Optimization of lithography performance at different Manhattan levels of ILT and electron beam shot size

Cuixiang Wang, Yu Mu, Futian Wang, Juan Wei, Ruihua Liu, Enqiang Tian, Di Liang, Yufei Sha, Yaokun Li, Hao Yang, Song Sun, Miao Jiang, Qingchen Cao, Jiangliu Shi

Proceedings Volume 13216, 1321625 (2024) https://doi.org/10.1117/12.3034463

KEYWORDS: Optical proximity correction, Semiconducting wafers, Lithography, Source mask optimization, Semiconductor manufacturing, Printing, Finite element methods, Electron beams, Electron beam lithography, Yield improvement

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Proceedings Article | 12 November 2024 Poster + Paper

Contour-based mask quantization methodology for curvilinear ILT mask and on wafer performance analysis

Futian Wang, Xiaonan Liu, Juan Wei, Miao Jiang, Cuixiang Wang, Yu Mu, Enqiang Tian, Yaokun Li, Song Sun, Ruihua Liu, Jiahao Xi, Yufei Sha, Di Liang, Hao Yang, Qingchen Cao, Jiangliu Shi

Proceedings Volume 13216, 132161Z (2024) https://doi.org/10.1117/12.3034016

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Manufacturing, SRAF, Critical dimension metrology, Contour extraction, Optical proximity correction, Error analysis, Quantization, Lithography

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Proceedings Article | 10 April 2024 Poster + Paper

Balancing mask manufacturability and image quality with inverse lithography: a study on variable fracture sizes

Fu Li, Yu Mu, Jingjing Fan, Chunlong Yu, Ruihua Liu, Song Sun, Chong Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 12953, 1295310 (2024) https://doi.org/10.1117/12.3010071

KEYWORDS: Optical proximity correction, Manufacturing, Lithography, Image quality, Vestigial sideband modulation, Scanning electron microscopy, Critical dimension metrology, Image processing, Shape analysis, Compliance

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Proceedings Article | 21 November 2023 Poster + Paper

Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology

Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi

Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740

KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing

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Proceedings Article | 21 November 2023 Poster + Paper

Rounded-corner aware OPC for convergency and lithography performance improving

Ruihua Liu, Fu Li, Chunlong Yu, Jingjing Fan, Yu Mu, Song Sun, Chong Wang, Jiangliu Shi, Qingchen Cao

Proceedings Volume 12751, 1275115 (2023) https://doi.org/10.1117/12.2686228

KEYWORDS: Optical proximity correction, Lithography, Photoresist processing, Reliability, Photoresist materials, Mask making, Manufacturing, Integrated circuits, Electron beams, Chip manufacturing

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