Mr. Jiawang Song Profile

Jiawang Song

at Applied Materials China

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Author

Publications (3)

Proceedings Article | 10 December 2024 Paper

Edge placement error analysis through backscattered electron imaging

Yuyang Bian, Na Li, Wenzhan Zhou, Biqiu Liu, Yu Zhang, Rong Huang, Jiawang Song, Qiang Zhou, Siqun Xiao, Or Zruya, Lee Rubinstein, Aner Avakrat, Jovian Delaforce, Antoine Legrain, Qing Ye, Frederic Roberten, Amir Rosen, Michael Shifrin

Proceedings Volume 13423, 134230C (2024) https://doi.org/10.1117/12.3052520

KEYWORDS: Optical lithography, Statistical analysis, Semiconductor manufacturing, Process control, Scanning electron microscopy, Line width roughness

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SPIE Journal Paper | 4 November 2022

Process window improvement for fin cut layer in self-aligned double-patterning process based on backscattered electron imaging

Yu Zhang, David Wei Zhang, Yuyang Bian, Biqiu Liu, Cong Zhang, Jun Huang, Jiawang Song, Yang Gao, Qiang Zhou, Wei Chen, Siqun Xiao, Shmuel Ben Nissim, Kevin Houchens, Omri Baum, Amit Zakay, Tal Ayzik, Yaniv Abramovitz

JM3, Vol. 21, Issue 04, 041605, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041605

KEYWORDS: Etching, System on a chip, Image processing, Sensors, Lithography, Semiconducting wafers, Distance measurement, Process control, Transistors, Signal to noise ratio

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Proceedings Article | 13 June 2022 Presentation

A holistic study of edge placement error on fin cut layer in self-aligned double patterning process

Yuyang Bian, Biqiu Liu, Xijun Guan, Xiaobo Guo, Cong Zhang, Wenzhan Zhou, Jun Huang, Yu Zhang, Jiawang Song, Yang Gao, Shmuel Nissim, Kevin Houchens, Omri Baum, Qiang Zhou, Zaisan Yang, Amit Zakay, Tal Ayzik, Yaniv Abramovitz

Proceedings Volume PC12053, PC120530D (2022) https://doi.org/10.1117/12.2614221

KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

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