Mr. Julio R. Reyes Profile

Julio R. Reyes

Senior Engineer at Tekscend Photomask Round Rock Inc

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Author

Publications (4)

Proceedings Article | 17 December 2003 Paper

EUV mask making: an approach based on the direct patterning of the EUV reflector

Christian Chovino, Laurent Dieu, Eric Johnstone, Julio Reyes, Bruno La Fontaine, Harry Levinson, Adam Pawloski

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518259

KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Reflectivity, Inspection, Reflectors, Lithography, Image processing

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Proceedings Article | 17 December 2003 Paper

193-nm haze contamination: a close relationship between mask and its environment

Eric Johnstone, Laurent Dieu, Christian Chovino, Julio Reyes, Dongsung Hong, Prakash Krishnan, Dianna Coburn, Christian Capella

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518262

KEYWORDS: Photomasks, Air contamination, Contamination, Pellicles, Reticles, Binary data, Glasses, Chemistry, Inspection, Environmental sensing

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Proceedings Article | 17 December 2003 Paper

Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM

Gim Chen, Julio Reyes, James Wood, Ismail Kashkoush, Laurent Dieu, Richard Novak

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518247

KEYWORDS: Photomasks, Transmittance, Reticles, Chemistry, Photoresist processing, Binary data, Mask cleaning, Reflectivity, Photoresist materials, Particles

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Proceedings Article | 28 August 2003 Paper

Semi-aqueous solvent applications for 193-nm EAPSM resist strip

Julio Reyes, Curt Jackson, Laurent Dieu, William Bowers, Russell Stevens

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504265

KEYWORDS: Reflectivity, Photomasks, Scanning probe microscopy, Chlorine, Photoresist processing, Etching, Phase shifts, Fluorine, Contamination, Phase measurement

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