Koutarou Sho
at Toshiba Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 15 March 2016 Paper
Ken Furubayashi, Koutarou Sho, Seiro Miyoshi, Shinji Yamaguchi, Kazunori Iida, Satoshi Usui, Tsuyoshi Morisaki, Naoki Sato, Hidefumi Mukai
Proceedings Volume 9780, 97800O (2016) https://doi.org/10.1117/12.2218416
KEYWORDS: Photomasks, Optical lithography, Lithography, Double patterning technology, Scanners, Semiconducting wafers, Reactive ion etching, Metals, Semiconductors, Lenses, Opacity, Etching, Critical dimension metrology, Anisotropic etching, Photoresist materials

Proceedings Article | 16 April 2011 Paper
Koutarou Sho, Tomoya Oori, Kazunori Iida, Katsutoshi Kobayashi, Keisuke Kikutani, Katsumi Yamamoto, Fumiki Aiso, Kentaro Matsunaga, Eishi Shiobara, Koji Hashimoto
Proceedings Volume 7972, 79720C (2011) https://doi.org/10.1117/12.877616
KEYWORDS: Etching, Photomasks, Lithography, Optical lithography, Semiconductors, Scanning electron microscopy, Photoresist processing, Silica, Double patterning technology, Critical dimension metrology

Proceedings Article | 1 April 2009 Paper
Koutaro Sho, Hirokazu Kato, Katsutoshi Kobayashi, Kazunori Iida, Tomoya Ori, Daizo Muto, Tsukasa Azuma, Shinichi Ito, Tomoharu Fujiwara, Yuuki Ishii, Yukio Nishimura, Takanori Kawakami, Motoyuki Shima
Proceedings Volume 7273, 72733B (2009) https://doi.org/10.1117/12.812475
KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Line width roughness, Thin film coatings, Lithography, Scanners, Chemical species, Defect inspection, Immersion lithography

Proceedings Article | 1 April 2008 Paper
Shoji Mimotogi, Masaki Satake, Yosuke Kitamura, Kazuhiro Takahata, Katsuyoshi Kodera, Hiroharu Fujise, Tatsuhiko Ema, Koutaro Sho, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kenji Yoshida, Hideki Kanai, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Katsura Miyashita, Soichi Inoue
Proceedings Volume 6924, 69240M (2008) https://doi.org/10.1117/12.772201
KEYWORDS: Lithography, Optical lithography, Scanners, SRAF, Semiconducting wafers, Lithographic illumination, Metals, Photomasks, Semiconductors, Logic devices

Proceedings Article | 31 March 2008 Paper
Tatsuhiko Ema, Koutaro Sho, Hiroki Yonemitsu, Yuriko Seino, Hiroharu Fujise, Akiko Yamada, Shoji Mimotogi, Yosuke Kitamura, Satoshi Nagai, Kotaro Fujii, Takashi Fukushima, Toshiaki Komukai, Akiko Nomachi, Tsukasa Azuma, Shinichi Ito
Proceedings Volume 6923, 69230E (2008) https://doi.org/10.1117/12.771008
KEYWORDS: Photoresist processing, Logic devices, Reflectivity, Photomasks, System on a chip, Etching, Transparency, Materials processing, Immersion lithography

Proceedings Article | 26 March 2008 Paper
Yuriko Seino, Katsutoshi Kobayashi, Koutaro Sho, Hirokazu Kato, Seiro Miyoshi, Keisuke Kikutani, Junko Abe, Hisataka Hayashi, Tokuhisa Ohiwa, Yasunobu Oonishi, Shinichi Ito
Proceedings Volume 6923, 69232O (2008) https://doi.org/10.1117/12.771840
KEYWORDS: System on a chip, Etching, Reactive ion etching, Reflectivity, Hydrogen, Fluorine, Lithography, Photoresist processing, Silica, Scanning electron microscopy

Proceedings Article | 27 March 2007 Paper
Shoji Mimotogi, Fumikatsu Uesawa, Makoto Tominaga, Hiroharu Fujise, Koutaro Sho, Mikio Katsumata, Hiroki Hane, Atsushi Ikegami, Seiji Nagahara, Tatsuhiko Ema, Masafumi Asano, Hideki Kanai, Taiki Kimura, Masaaki Iwai
Proceedings Volume 6520, 652008 (2007) https://doi.org/10.1117/12.711049
KEYWORDS: Lithography, Immersion lithography, Photomasks, Critical dimension metrology, Phase shifting, Lithographic illumination, Phase shifts, Logic, Metals, Semiconductors

Proceedings Article | 12 May 2005 Paper
Shoji Mimotogi, Fumikatsu Uesawa, Suigen Kyoh, Hiroharu Fujise, Eishi Shiobara, Mikio Katsumata, Hiroki Hane, Tomohiro Sugiyama, Koutaro Sho, Maki Miyazaki, Kazuhiro Takahata, Hideki Kanai, Kazuya Sato, Kohji Hashimoto
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600948
KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Lens design, Photoresist processing, CMOS technology, Optical lithography, Metals, Logic, Semiconductors

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599209
KEYWORDS: Line width roughness, Photoresist processing, Image processing, Critical dimension metrology, Ultraviolet radiation, Scanning electron microscopy, Reactive ion etching, Polymers, Lithography, Absorption

Proceedings Article | 4 May 2005 Paper
Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, Kentarou Matsunaga, Naofumi Shibata, Kaoru Ozawa, Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, Seiki Ishida, Takayuki Toshima, Yasunobu Oonishi, Shinichi Ito
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599314
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Digital watermarking, Immersion lithography, Silicon, Photoresist processing, Thin film coatings, Coating, Liquids, Water

Proceedings Article | 12 June 2003 Paper
Koutaro Sho, Tsuyoshi Shibata, Hirokazu Kato, Junko Abe, Yoshinobu Ohnishi, Kazuhiko Urayama
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485089
KEYWORDS: Etching, Reactive ion etching, Silicon, Photoresist processing, Scanning electron microscopy, Lithography, Photomasks, Coating, Thin film coatings, Image processing

Proceedings Article | 24 July 2002 Paper
Tsuyoshi Shibata, Seiji Nakagawa, Yasuhiko Sato, Koutaro Sho, Hisataka Hayashi, Junko Abe
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474278
KEYWORDS: Lithography, Reflectivity, Reactive ion etching, Photoresist processing, Etching, Deep ultraviolet, Carbon, Scanning electron microscopy, Photoresist materials, Imaging systems

Proceedings Article | 27 April 1999 Paper
Shinichi Ito, Kei Hayasaki, Kenji Kawano, Koutaro Sho, Shoji Mimotogi, Fumio Komatsu, Katsuya Okumura
Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346907
KEYWORDS: Semiconducting wafers, Process control, Image processing, Critical dimension metrology, Process engineering, Control systems, Image analysis, Deep ultraviolet, CCD cameras, Microelectronics

Showing 5 of 13 publications
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