Dr. Michael Hibbs Profile
Dr. Michael Hibbs
Senior Engineer
SPIE Involvement:
Author
Publications (35)

SPIE Journal Paper | 9 June 2016
JM3, Vol. 15, Issue 02, 021410, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021410
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963511 (2015) https://doi.org/10.1117/12.2197729
KEYWORDS: Inspection, Photomasks, Reticles, Defect detection, Semiconducting wafers, Optical proximity correction, Databases, Lithography, SRAF, Printing

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 923516 (2014) https://doi.org/10.1117/12.2069787
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Image processing, Inspection, Printing, Scanning electron microscopy, Multilayers, Lithography, Mask making

Proceedings Article | 1 October 2013 Paper
A. Zweber, A. McGuire, M. Hibbs, S. Nash, K. Ballman, T. Faure, J. Rankin, T. Isogawa, T. Senna, Y. Negishi, M. Miller, S. Barai, D. Dechene
Proceedings Volume 8880, 88800P (2013) https://doi.org/10.1117/12.2028909
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Data modeling, Logic, Chromium, Lithography, SRAF, Metrology, Immersion lithography

Proceedings Article | 23 September 2013 Paper
Proceedings Volume 8880, 88800E (2013) https://doi.org/10.1117/12.2027307
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Optical proximity correction, SRAF, Defect detection, Lithography, Critical dimension metrology, Opacity

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 81660W (2011) https://doi.org/10.1117/12.898899
KEYWORDS: Fiber optic illuminators, Photomasks, Source mask optimization, Lithography, Diffractive optical elements, Lithographic illumination, Optics manufacturing, Computer simulations, Optical lithography, Binary data

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78230M (2010) https://doi.org/10.1117/12.865358
KEYWORDS: Photomasks, Semiconducting wafers, Reflectivity, Pellicles, Diffraction, Binary data, Stray light, Opacity, Polarization, Manufacturing

Proceedings Article | 16 March 2010 Paper
David Melville, Alan Rosenbluth, Kehan Tian, Kafai Lai, Saeed Bagheri, Jaione Tirapu-Azpiroz, Jason Meiring, Scott Halle, Greg McIntyre, Tom Faure, Daniel Corliss, Azalia Krasnoperova, Lei Zhuang, Phil Strenski, Andreas Waechter, Laszlo Ladanyi, Francisco Barahona, Daniele Scarpazza, Jon Lee, Tadanobu Inoue, Masaharu Sakamoto, Hidemasa Muta, Alfred Wagner, Geoffrey Burr, Young Kim, Emily Gallagher, Mike Hibbs, Alexander Tritchkov, Yuri Granik, Moutaz Fakhry, Kostas Adam, Gabriel Berger, Michael Lam, Aasutosh Dave, Nick Cobb
Proceedings Volume 7640, 764006 (2010) https://doi.org/10.1117/12.846716
KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

SPIE Journal Paper | 1 January 2010
JM3, Vol. 9, Issue 01, 013010, (January 2010) https://doi.org/10.1117/12.10.1117/1.3295712
KEYWORDS: Photomasks, Binary data, Optical proximity correction, Lithography, Opacity, Semiconducting wafers, Data modeling, Electromagnetism, Calibration, Phase shifting

Proceedings Article | 16 March 2009 Paper
Kafai Lai, Alan Rosenbluth, Saeed Bagheri, John Hoffnagle, Kehan Tian, David Melville, Jaione Tirapu-Azpiroz, Moutaz Fakhry, Young Kim, Scott Halle, Greg McIntyre, Alfred Wagner, Geoffrey Burr, Martin Burkhardt, Daniel Corliss, Emily Gallagher, Tom Faure, Michael Hibbs, Donis Flagello, Joerg Zimmermann, Bernhard Kneer, Frank Rohmund, Frank Hartung, Christoph Hennerkes, Manfred Maul, Robert Kazinczi, Andre Engelen, Rene Carpaij, Remco Groenendijk, Joost Hageman, Carsten Russ
Proceedings Volume 7274, 72740A (2009) https://doi.org/10.1117/12.814680
KEYWORDS: Photomasks, Source mask optimization, Diffractive optical elements, Manufacturing, Lithographic illumination, Lithography, Semiconducting wafers, Photovoltaics, Polarization, Printing

Proceedings Article | 16 March 2009 Paper
Alan Rosenbluth, David Melville, Kehan Tian, Saeed Bagheri, Jaione Tirapu-Azpiroz, Kafai Lai, Andreas Waechter, Tadanobu Inoue, Laszlo Ladanyi, Francisco Barahona, Katya Scheinberg, Masaharu Sakamoto, Hidemasa Muta, Emily Gallagher, Tom Faure, Michael Hibbs, Alexander Tritchkov, Yuri Granik
Proceedings Volume 7274, 727409 (2009) https://doi.org/10.1117/12.814844
KEYWORDS: Photomasks, Source mask optimization, Lithography, Optimization (mathematics), Wavefronts, Manufacturing, Chemical elements, Fiber optic illuminators, Image processing, Optics manufacturing

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712209 (2008) https://doi.org/10.1117/12.801950
KEYWORDS: Photomasks, Binary data, Opacity, Chromium, Etching, Photoresist processing, Critical dimension metrology, Quartz, Phase shifts, Mask making

Proceedings Article | 17 October 2008 Paper
N. Zhou, K. Racette, M. Hibbs, T. Mizoguchi, D. Hasselbeck, M. Barrett, R. Nolan, F. Houle, J. Ritter, A. Wagner, M. Caterer
Proceedings Volume 7122, 71220B (2008) https://doi.org/10.1117/12.801663
KEYWORDS: Pellicles, Photomasks, Adhesives, Data modeling, Inspection, Distortion, Transmittance, Immersion lithography, Lenses, Fermium

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6924, 69240Y (2008) https://doi.org/10.1117/12.774443
KEYWORDS: Photomasks, Polarization, Finite-difference time-domain method, Binary data, Data modeling, Calibration, Computer simulations, Electromagnetism, Lithography, Optical proximity correction

Proceedings Article | 30 October 2007 Paper
Richard Wistrom, Toru Komizo, Michael Hibbs, Gary Reid
Proceedings Volume 6730, 673007 (2007) https://doi.org/10.1117/12.746421
KEYWORDS: Etching, Quartz, Photomasks, Chromium, Phase measurement, Principal component analysis, Diagnostics, Manufacturing, Molybdenum, Phase shifts

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63491A (2006) https://doi.org/10.1117/12.686231
KEYWORDS: Attenuators, Phase shifts, Phase shifting, 3D modeling, Diffraction, Polarization, Opacity, Refractive index, Phase measurement, Silica

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 628322 (2006) https://doi.org/10.1117/12.681767
KEYWORDS: Etching, Reflection, Quartz, Photomasks, Phase shifts, Phase measurement, Inspection, Surface roughness, Scanning electron microscopy, Radium

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521L (2006) https://doi.org/10.1117/12.655729
KEYWORDS: Photomasks, Phase measurement, Phase shifts, Calibration, Diffraction, Diffraction gratings, Metrology, Attenuators, Polarization, Silica

Proceedings Article | 10 May 2005 Paper
Karen Badger, Shahid Butt, Jay Burnham, Tom Faure, Michael Hibbs, Jed Rankin, David Thibault, Andrew Watts
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601159
KEYWORDS: Photomasks, Inspection, Absorption, Microscopes, Lithography, Semiconducting wafers, Reflectivity, Glasses, Diagnostics, Opacity

Proceedings Article | 10 May 2005 Paper
Kenneth Racette, Monica Barrett, Michael Hibbs, Max Levy
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599598
KEYWORDS: Photomasks, Pellicles, Chromium, Quartz, Optical lithography, Coating, Polishing, Aluminum, Lithography, Image processing

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537447
KEYWORDS: Reticles, Critical dimension metrology, Photomasks, Binary data, Lithography, Scanners, Scanning electron microscopy, Phase shifts, Semiconducting wafers, Optical lithography

Proceedings Article | 28 August 2003 Paper
Jason Plumhoff, Chris Constantine, Jong Shin, B. Reelfs, Emmanuel Rausa, Jason Benz, Michael Hibbs, Timothy Brunner
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504198
KEYWORDS: Etching, Quartz, Photomasks, Image processing, Diffractive optical elements, Dry etching, Phase shifts, Surface roughness, Scanning electron microscopy, Chromium

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485504
KEYWORDS: Photomasks, Critical dimension metrology, Diffraction, Lithography, Error control coding, Phase shifting, Control systems, Tolerancing, Optical lithography, Phase shifts

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474584
KEYWORDS: Etching, Photomasks, Phase shifting, Diffraction, Phase shifts, Quartz, Optical lithography, Microscopes, Fourier transforms, Reticles

SPIE Journal Paper | 1 April 2002
JM3, Vol. 1, Issue 01, (April 2002) https://doi.org/10.1117/12.10.1117/1.1448500
KEYWORDS: Photomasks, Optimization (mathematics), Reticles, Diffraction, Wavefronts, Algorithm development, Phase shifts, Tolerancing, Resolution enhancement technologies, Detection and tracking algorithms

Proceedings Article | 14 September 2001 Paper
S. Chey, Charles Guarnieri, Katherina Babich, Keith Pope, Dario Goldfarb, Marie Angelopoulos, Kenneth Racette, Michael Hibbs, Margaret Gibson, Kurt Kimmel
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435779
KEYWORDS: Composites, Thin films, Photomasks, Phase shifts, Etching, Manufacturing, Dry etching, Oxygen, Transmittance, Metals

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435748
KEYWORDS: Photomasks, Optimization (mathematics), Reticles, Wavefronts, Algorithm development, Diffraction, Tolerancing, Resolution enhancement technologies, Detection and tracking algorithms, Phase shifts

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410721
KEYWORDS: Photomasks, Phase shifts, Inspection, Lithography, Etching, Reflectivity, Attenuators, Molybdenum, Manufacturing, Excimer lasers

Proceedings Article | 14 June 1999 Paper
Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350859
KEYWORDS: Phase measurement, Photomasks, Phase shifts, Interferometry, Phase shifting, Image analysis, Fringe analysis, Interferometers, Lithography, Etching

Proceedings Article | 24 July 1996 Paper
James Reynolds, Franklin Schellenberg, Michael Hibbs, Dennis Hayden
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245225
KEYWORDS: Photomasks, Carbon, Semiconducting wafers, Reticles, Atomic force microscopy, Binary data, Inspection, Scanning electron microscopy, Deep ultraviolet

Proceedings Article | 9 June 1995 Paper
Mark Horn, Brian Maxwell, Roderick Kunz, Michael Hibbs, Lynn Eriksen, Susan Palmateer, Anthony Forte
Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210368
KEYWORDS: Polymers, Plasma enhanced chemical vapor deposition, Lithography, Photoresist materials, Photoresist processing, Chemistry, Silicon, Plasma, Photoresist developing, Etching

Proceedings Article | 26 May 1995 Paper
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209242
KEYWORDS: Lithography, Prototyping, Excimer lasers, Argon ion lasers, Projection systems, Fiber optic illuminators, Optical lithography, Photoresist materials, Optical components, Light sources

Proceedings Article | 17 May 1994 Paper
Timothy Brunner, Alexander Martin, Ronald Martino, Christopher Ausschnitt, Thomas Newman, Michael Hibbs
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175449
KEYWORDS: Semiconducting wafers, Overlay metrology, Monochromatic aberrations, Photomasks, Metrology, Phase shifts, Lithography, Calibration, Image processing, Data acquisition

Proceedings Article | 1 July 1991 Paper
Joseph Kirk, Michael Hibbs
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44817
KEYWORDS: Deep ultraviolet, Absorption, Photoresist materials, Calibration, Diagnostics, Optical lithography, Lithography, Photoresist processing, Semiconducting wafers, Image processing

Proceedings Article | 1 July 1991 Paper
Diana Dunn, James Bruce, Michael Hibbs
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44770
KEYWORDS: Reflectivity, Semiconducting wafers, Absorption, Silicon, Optical lithography, Thin films, Photoresist materials, Deep ultraviolet, Refraction, Chlorine

Showing 5 of 35 publications
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