Prof. Takashi Toshima Profile

Prof. Takashi Toshima

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Proceedings Article | 13 November 2024 Poster

Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing II

Hakaru Mizoguchi, Kentaro Tomita, Daisuke Nakamura, Yukihiro Yamagata, Takeshi Higashiguchi, Takashi Toshima, Hiroki Kondo, Takuji Sakamoto, Tanemasa Asano, Masaharu Shiratani, Atsushi Sunahara

Proceedings Volume PC13215, PC132150T (2024) https://doi.org/10.1117/12.3034536

KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Carbon dioxide lasers, Semiconductor manufacturing, Light sources, Tin, High volume manufacturing, Semiconductors, Lithography

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