Dr. Zheng Cui
Senior Scientist at Science and Technology Facilities Council
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 28 November 2007 Paper
Proceedings Volume 6724, 67240A (2007) https://doi.org/10.1117/12.782497
KEYWORDS: Electron beam lithography, Silicon, Etching, Deep reactive ion etching, Photoresist processing, Nanolithography, Reactive ion etching, Photomasks, Chemically amplified resists, Standards development

SPIE Journal Paper | 1 January 2006
Yifang Chen, Jiarui Tao, Xing-Zhong Zhao, Zheng Cui
JM3, Vol. 5, Issue 01, 011002, (January 2006) https://doi.org/10.1117/12.10.1117/1.2172991
KEYWORDS: Nanoimprint lithography, Silicon, Gallium arsenide, Polymethylmethacrylate, Lithography, Etching, Electron beam lithography, Scanning electron microscopy, Distortion, Dry etching

Proceedings Article | 28 September 2005 Paper
Proceedings Volume 5955, 59550C (2005) https://doi.org/10.1117/12.620446
KEYWORDS: Nanoimprint lithography, Dielectrics, Lithography, Metamaterials, Silicon, Electron beam lithography, Manufacturing, Dielectric polarization, Etching, Optics manufacturing

Proceedings Article | 30 December 2004 Paper
Proceedings Volume 5641, (2004) https://doi.org/10.1117/12.581272
KEYWORDS: Silicon, Microelectromechanical systems, Polymers, Microopto electromechanical systems, Etching, Microsystems, Manufacturing, Micromachining, Microfabrication, Metals

Proceedings Article | 25 March 2003 Paper
Jun Yao, Deepak Uttamchandani, Yixiao Zhang, Yongkang Guo, Zheng Cui
Proceedings Volume 4945, (2003) https://doi.org/10.1117/12.468419
KEYWORDS: Microlens, Photomasks, Photoresist materials, Optical components, Microlens array, Lithography, Chromatic aberrations, OSLO, Optical design, Photoresist developing

SPIE Journal Paper | 1 February 2003
Qinjun Peng, Shijie Liu, Yongkang Guo, Bo Chen, Jinglei Du, Yangsu Zeng, Chongxi Zhou, Zheng Cui
OE, Vol. 42, Issue 02, (February 2003) https://doi.org/10.1117/12.10.1117/1.1531976
KEYWORDS: LCDs, Optical lithography, Axicons, Photomasks, Etching, Photoresist materials, Fabrication, Lithography, Computer simulations, Light sources

Proceedings Article | 17 January 2003 Paper
Zheng Cui, Jinglei Du, Yongkang Guo
Proceedings Volume 4984, (2003) https://doi.org/10.1117/12.477831
KEYWORDS: Photomasks, Optical lithography, Microlens, Electron beam lithography, Optical components, Modulation, Photoresist materials, LCDs, Glasses, Etching

Proceedings Article | 13 November 2002 Paper
Zhan Zhao, Dafu Cui, Shanhong Xia, Zheng Cui
Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.469426
KEYWORDS: Electrodes, Sensors, Glasses, Photoresist materials, Capillaries, Temperature sensors, Microfluidics, Gold, Polymers, Analytical research

Proceedings Article | 3 June 2002 Paper
Fuhua Gao, Yangsu Zeng, Shiwei Xie, Feng Gao, Jun Yao, Yongkang Guo, Jinglei Du, Zheng Cui
Proceedings Volume 4659, (2002) https://doi.org/10.1117/12.469296
KEYWORDS: Chemical elements, Diffraction, Binary data, Zone plates, Holography, Manufacturing, Laser systems engineering, Diffraction gratings, Diffractive optical elements, Laser energy

Proceedings Article | 19 April 2002 Paper
Yixiao Zhang, Jinglei Du, Jingguo Yang, Yangsu Zeng, Yongkang Guo, Zheng Cui, Jun Yao
Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462880
KEYWORDS: Image filtering, Optical lithography, Image quality, Image resolution, Fourier transforms, Fractional fourier transform, Image processing, Imaging systems, Image enhancement, Optical filters

Proceedings Article | 19 April 2002 Paper
Zheng Cui, Zhan Zhao, Shanhong Xia
Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462884
KEYWORDS: Silicon, Liquids, Platinum, Semiconducting wafers, Failure analysis, Stress analysis, Structural design, Silicon films, Sensors, Polymers

Proceedings Article | 19 April 2002 Paper
Qinjun Peng, Yongkang Guo, Bo Chen, Jinglei Du, Jinshan Xiang, Zheng Cui
Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462879
KEYWORDS: LCDs, Photomasks, Axicons, Optical lithography, Etching, Photoresist materials, Fabrication, Glasses, Electrodes, Lithography

Proceedings Article | 14 September 2001 Paper
Deyong Chen, Dafu Cui, Li Wang, Zhongyao Yu, Zheng Cui, Shanhong Xia
Proceedings Volume 4414, (2001) https://doi.org/10.1117/12.440192

Proceedings Article | 14 September 2001 Paper
Zheng Cui, Jinglei Du, Yangsu Zheng, Yongkang Guo
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435689
KEYWORDS: Photomasks, Optical simulations, Optical lithography, Electron beam lithography, Distortion, Photoresist materials, Monte Carlo methods, 3D image processing, Lithography, Image processing

Proceedings Article | 14 September 2001 Paper
Zhan Zhao, Dafu Cui, Zhongyao Yu, Li Wang, Shanhong Xia, Zheng Cui
Proceedings Volume 4414, (2001) https://doi.org/10.1117/12.440202

SPIE Journal Paper | 1 September 2001
Jun Yao, Fuhua Gao, Yongkang Guo, Zheng Cui
OE, Vol. 40, Issue 09, (September 2001) https://doi.org/10.1117/12.10.1117/1.1391259
KEYWORDS: Water, Microlens array, Molecules, Hydrogen, Etching, Proteins, Chemical elements, Photoresist materials, Chromium, Microlens

Proceedings Article | 30 April 2001 Paper
Zheng Cui, Derek Jenkins, Andreas Schneider, Geoff McBride
Proceedings Volume 4407, (2001) https://doi.org/10.1117/12.425291
KEYWORDS: Photoresist materials, X-rays, Ultraviolet radiation, Electron beams, Electron beam lithography, Collimators, Scattering, Mercury, Lamps, Laser scattering

Proceedings Article | 30 April 2001 Paper
Zheng Cui, Zhan Zhao, Shanhong Xia
Proceedings Volume 4407, (2001) https://doi.org/10.1117/12.425312
KEYWORDS: Silicon, Liquids, Modeling, Silicon films, Thin films, Etching, Semiconducting wafers, Microelectromechanical systems, Computer simulations, Oxides

Proceedings Article | 26 April 2001 Paper
Zheng Cui, Jinglei Du
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425225
KEYWORDS: Photomasks, Electron beam lithography, Optical proximity correction, Optical lithography, Distortion, Optical simulations, Lithography, Laser scanners, Photoresist materials, Semiconducting wafers

Proceedings Article | 5 April 2001 Paper
Deyong Chen, Dafu Cui, Zhongyao Yu, Li Wang, Zheng Cui, Shanhong Xia
Proceedings Volume 4408, (2001) https://doi.org/10.1117/12.425398
KEYWORDS: Sensors, Silicon, Resonators, Finite element methods, Resistors, Microelectromechanical systems, Silicon films, Signal detection, Crystals, Laser crystals

Proceedings Article | 5 April 2001 Paper
Zheng Cui, Deyong Chen, Shanhong Xia
Proceedings Volume 4408, (2001) https://doi.org/10.1117/12.425388
KEYWORDS: Silicon, Sensors, Silicon films, Resonators, Thin films, Platinum, Computer simulations, Signal detection, Electrodes, Modeling

Proceedings Article | 18 August 2000 Paper
Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395682
KEYWORDS: Water, Molecules, Proteins, Microlens, Microlens array, Etching, Hydrogen, Photoresist materials, Chemical elements, Binary data

Proceedings Article | 5 July 2000 Paper
Jinglei Du, Fuhua Gao, Yixiao Zhang, Yongkang Guo, Chunlei Du, Zheng Cui
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388940
KEYWORDS: Photoresist materials, Optical proximity correction, Optical simulations, Laser scattering, Photoresist developing, Scattering, Lithography, Distortion, Microfabrication, Electron beam lithography

SPIE Journal Paper | 1 March 2000
Jinglei Du, Fuhua Gao, Yongkang Guo, Chunlei Du, Chuankai Qiu, Zheng Cui
OE, Vol. 39, Issue 03, (March 2000) https://doi.org/10.1117/12.10.1117/1.602426
KEYWORDS: Photoresist materials, Lithography, Distortion, Optical proximity correction, Laser scattering, Optical simulations, Scattering, Photomasks, Printing, Microfabrication

Proceedings Article | 26 July 1999 Paper
Yongkang Guo, Jinglei Du, Qizhong Huang, Jun Yao, Chuankai Qiu, Zheng Cui
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354383
KEYWORDS: Lithography, Optical proximity correction, Laser systems engineering, Laser optics, Electron beam lithography, Optical lithography, Projection lithography, Distortion, Laser scattering, Submicron lithography

Proceedings Article | 25 June 1999 Paper
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351122
KEYWORDS: Monte Carlo methods, Electron beam lithography, Computer simulations, Scattering, Silicon, Optical simulations, Lithography, Signal detection, Laser scattering, Semiconducting wafers

Proceedings Article | 7 May 1999 Paper
Jinglei Du, Jingqin Su, Qizhong Huang, Yixiao Zhang, Yongkang Guo, Chunlei Du, Zheng Cui
Proceedings Volume 3740, (1999) https://doi.org/10.1117/12.347834
KEYWORDS: Optical proximity correction, Photomasks, Image compression, Modulation, Optical lithography, Image filtering, Microfabrication, Imaging systems, Computer simulations, Light sources

Proceedings Article | 10 March 1999 Paper
Jingqin Su, Jinglei Du, Jun Yao, Fuhua Gao, Yongkang Guo, Zheng Cui
Proceedings Volume 3680, (1999) https://doi.org/10.1117/12.341286
KEYWORDS: Photomasks, Modulation, Photoresist developing, Optical lithography, Image processing, 3D modeling, Photoresist materials, Computer simulations, Electron beam lithography, Photoresist processing

Proceedings Article | 29 June 1998 Paper
Jinglei Du, Qizhong Huang, Yongkang Guo, Zheng Cui
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310722
KEYWORDS: Optical proximity correction, Photomasks, Image quality, Image transmission, Distortion, Optical lithography, Image processing, Transmittance, Image resolution, Mechanics

Proceedings Article | 5 June 1998 Paper
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309596
KEYWORDS: Monte Carlo methods, Thermal effects, 3D modeling, Electron beam lithography, Photomasks, Computer simulations, Temperature metrology, Optical simulations, Diffusion, Scattering

SPIE Journal Paper | 1 May 1998
Mingbao Zhou, Dajian Lin, Zheng Cui, Philip Prewett, Lurong Guo, Yongkang Guo
OE, Vol. 37, Issue 05, (May 1998) https://doi.org/10.1117/12.10.1117/1.601680
KEYWORDS: Diffractive optical elements, Optical design, Diffraction, Wavefronts, Far-field diffraction, Quantization, Beam splitters, Image transmission, Optical engineering, Electronics

Proceedings Article | 25 September 1997 Paper
Proceedings Volume 3155, (1997) https://doi.org/10.1117/12.279404
KEYWORDS: Finite element methods, Field emission displays, Electrons, Electrodes, Computer simulations, Optical resolution, LCDs, Manufacturing, Chemical elements, Image resolution

Proceedings Article | 7 July 1997 Paper
Zheng Cui, Philip Prewett, John Watson
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276022
KEYWORDS: Phase shifts, Gallium, Ion beams, Ions, Plasma etching, Etching, Plasma, Sputter deposition, Phase shifting, Opacity

Proceedings Article | 7 July 1997 Paper
Zheng Cui, R. Moody, Ian Loader, John Watson, Philip Prewett
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275869
KEYWORDS: Critical dimension metrology, Chemically amplified resists, Electron beam lithography, Photoresist processing, Electron beams, Manufacturing, Lithography, Silicon, Scanning electron microscopy, Metrology

Proceedings Article | 26 May 1995 Paper
Zheng Cui, Philip Prewett, Brian Martin
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209284
KEYWORDS: Photomasks, Image enhancement, Phase shifts, Image quality, Computer simulations, Lithography, Semiconducting wafers, Etching, Quartz, Reticles

Proceedings Article | 22 May 1995 Paper
Philip Prewett, Zheng Cui, John Watson, Brian Martin
Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209204
KEYWORDS: Phase shifts, Photomasks, Gallium, Ion beams, Opacity, Ions, Lithography, Optical lithography, Signal attenuation, Carbon

Proceedings Article | 19 May 1995 Paper
Jianguo Zhu, Zheng Cui, Philip Prewett
Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209175
KEYWORDS: Scattering, Polymethylmethacrylate, Electron beams, Laser scattering, Lithography, Data modeling, Electron beam lithography, Software, Critical dimension metrology, Scanning electron microscopy

Proceedings Article | 17 May 1994 Paper
Zheng Cui, Brian Martin, Philip Prewett, Steve Johnson, Philip Herman
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175420
KEYWORDS: Photomasks, Phase shifts, Binary data, Lithography, Computer simulations, Image analysis, Quartz, Etching, Transmittance, Semiconductors

Showing 5 of 38 publications
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