Dr. Mark A. McCord
Principal Engineer at PDF Solutions Inc
SPIE Involvement:
Author | Instructor
Publications (22)

Proceedings Article | 28 March 2014 Paper
Allen Carroll, Luca Grella, Kirk Murray, Mark McCord, Paul Petric, William Tong, Christopher Bevis, Shy-Jay Lin, Tsung-Hsin Yu, Tze-Chiang Huang, T. Wang, Wen-Chuan Wang, J. Shin
Proceedings Volume 9049, 904917 (2014) https://doi.org/10.1117/12.2048528
KEYWORDS: Mirrors, Lithography, Semiconducting wafers, Error control coding, Reflectivity, Switching, Electrodes, Data compression, Printing, Electron beam lithography

Proceedings Article | 28 March 2014 Paper
Shy-Jay Lin, T. Bao, C. Lu, S.-C. Wang, T. C. Chien, J.-J. Shin, Burn Lin, Mark McCord, Alan Brodie, Allen Carroll, Luca Grella
Proceedings Volume 9049, 90491X (2014) https://doi.org/10.1117/12.2045416
KEYWORDS: Dielectrics, Electrodes, Electron beam lithography, Microelectromechanical systems, Atomic layer deposition, Lens design, Structural design, Coating, Reflectivity, Electron beams

SPIE Journal Paper | 5 August 2013 Open Access
Luca Grella, Allen Carroll, Kirk Murray, Mark McCord, William Tong, Alan Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, Jeffrey Elam
JM3, Vol. 12, Issue 03, 031107, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031107
KEYWORDS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity

Proceedings Article | 26 March 2013 Paper
Alan Brodie, Shinichi Kojima, Mark McCord, Luca Grella, Thomas Gubiotti, Chris Bevis
Proceedings Volume 8680, 868029 (2013) https://doi.org/10.1117/12.2011908
KEYWORDS: Electron beam lithography, Monte Carlo methods, Lithography, Line width roughness, Photomasks, Electron beams, Logic, Photoresist processing, Nanoimprint lithography, Semiconductor manufacturing

Proceedings Article | 26 March 2013 Paper
Proceedings Volume 8680, 86801C (2013) https://doi.org/10.1117/12.2010865
KEYWORDS: Electroluminescence, Raster graphics, Scattering, Monte Carlo methods, Silica, Diffusion, Laser scattering, Quantization, Modulation transfer functions, Backscatter

Proceedings Article | 8 November 2012 Paper
Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis
Proceedings Volume 8522, 85221J (2012) https://doi.org/10.1117/12.964978
KEYWORDS: Electron beam lithography, Lithography, Semiconducting wafers, Reflectivity, Logic, YAG lasers, Direct write lithography, Wafer-level optics, Computer aided design, Electron beams

Proceedings Article | 21 March 2012 Paper
Mark McCord, Paul Petric, Upendra Ummethala, Allen Carroll, Shinichi Kojima, Luca Grella, Sameet Shriyan, Charles Rettner, Chris Bevis
Proceedings Volume 8323, 832311 (2012) https://doi.org/10.1117/12.919744
KEYWORDS: Semiconducting wafers, Electron beam lithography, Wafer-level optics, Lithography, Metrology, Integrated optics, Electron beams, Reflectivity, Silicon, Modulation

Proceedings Article | 4 April 2011 Paper
Regina Freed, Jeff Sun, Alan Brodie, Paul Petric, Mark McCord, Kurt Ronse, Luc Haspeslagh, Bart Vereecke
Proceedings Volume 7970, 79701T (2011) https://doi.org/10.1117/12.879454
KEYWORDS: Electron beam lithography, Semiconducting wafers, Lithography, Electrodes, Mirrors, Microelectromechanical systems, Etching, Reflectivity, Electron beams, Tin

Proceedings Article | 4 April 2011 Paper
Paul Petric, Chris Bevis, Mark McCord, Allen Carroll, Alan Brodie, Upendra Ummethala, Luca Grella, Anthony Cheung, Regina Freed
Proceedings Volume 7970, 797018 (2011) https://doi.org/10.1117/12.882636
KEYWORDS: Semiconducting wafers, Mirrors, Reflectivity, Microelectromechanical systems, Magnetism, Photography, Electron beam lithography, Wafer-level optics, YAG lasers, Lithography

Proceedings Article | 18 March 2009 Open Access Paper
Paul Petric, Chris Bevis, Alan Brodie, Allen Carroll, Anthony Cheung, Luca Grella, Mark McCord, Henry Percy, Keith Standiford, Marek Zywno
Proceedings Volume 7271, 727107 (2009) https://doi.org/10.1117/12.817319
KEYWORDS: Semiconducting wafers, Electron beam lithography, Lithography, Electron beams, Reflectivity, Wafer-level optics, Prisms, Calibration, Electrodes, Mirrors

Proceedings Article | 5 April 2007 Paper
Luke Lin, Jia-Yun Chen, Wen-Yi Wong, Mark McCord, Alex Tsai, Steven Oestreich, Indranil De, Jan Lauber, Andrew Kang
Proceedings Volume 6518, 65182F (2007) https://doi.org/10.1117/12.712386
KEYWORDS: Semiconducting wafers, Etching, Inspection, Wafer inspection, Electron beams, Wafer-level optics, Lithography, Wafer testing, Defect inspection, Thin film coatings

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.606102
KEYWORDS: Chromium, Inspection, Etching, Lithography, Electron beams, Oxides, Indium, Tin, Quartz, Electron beam lithography

Proceedings Article | 18 December 1998 Paper
Min Bai, Daniel Pickard, Corina Tanasa, Mark McCord, C. Neil Berglund, Roger Fabian Pease
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332874
KEYWORDS: Electron beams, Lithography, Optical spheres, Diffusion, Semiconducting wafers, Photomasks, Silicon, Electron beam lithography, Solids, Scattering

Proceedings Article | 29 June 1998 Paper
Amir Aalam Ghazanfarian, Xun Chen, Mark McCord, Roger Fabian Pease
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310778
KEYWORDS: Optical alignment, Signal processing, Chemical mechanical planarization, Computer simulations, Signal detection, Metrology, Fourier transforms, Lithography, Chemical reactions, Metals

Proceedings Article | 29 June 1998 Paper
Xun Chen, Amir Aalam Ghazanfarian, Mark McCord, Roger Fabian Pease
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310724
KEYWORDS: Optical alignment, Semiconducting wafers, Coating, Polarization, Photomasks, Diffraction, Reflection, Interfaces, Diodes, Signal detection

Proceedings Article | 5 June 1998 Paper
Liqun Han, Mark McCord, Gil Winograd, Roger Fabian Pease
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309583
KEYWORDS: Charged-particle lithography, Monte Carlo methods, Imaging systems, Semiconducting wafers, Electron beams, Magnetism, Photomasks, Particles, Optical simulations, Electron beam lithography

Proceedings Article | 7 July 1997 Paper
Amir Aalam Ghazanfarian, Roger Fabian Pease, Xun Chen, Mark McCord
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276056
KEYWORDS: Distortion, Optical alignment, Neural networks, Manufacturing, Semiconducting wafers, Signal processing, Lithography, Chemical reactions, Chemical mechanical planarization

Proceedings Article | 27 May 1996 Paper
Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240461
KEYWORDS: Ultraviolet radiation, Semiconducting wafers, Deep ultraviolet, Etching, Electron beam lithography, Photoresist materials, Lithography, Silicon, Photoresist processing, Polymers

Proceedings Article | 19 May 1995 Paper
Christine Nelson, Scott Hector, William Chu, Philip Seese, Matthew Thompson, Victor Pol, Mark McCord, James Oberschmidt, James Taylor
Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209161
KEYWORDS: Etching, Scanning electron microscopy, Semiconducting wafers, X-ray lithography, Photomasks, Resistance, Metrology, Lithography, Synchrotrons, Reactive ion etching

Proceedings Article | 19 May 1995 Paper
Kathleen Early, David Trindade, Quinn Leonard, Franco Cerrina, Klaus Simon, Mark McCord, Daniel DeMay
Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209183
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Etching, X-ray lithography, X-rays, Error analysis, Synchrotrons, Metrology

Proceedings Article | 3 October 1993 Paper
Mark McCord, Roger Fabian Pease
Proceedings Volume 10310, 1031003 (1993) https://doi.org/10.1117/12.183194

Proceedings Article | 3 October 1993 Paper
T. H. Philip Chang, Lawrence Muray, Urs Staufer, Mark McCord, Dieter Kern
Proceedings Volume 10310, 1031009 (1993) https://doi.org/10.1117/12.183200

Showing 5 of 22 publications
Course Instructor
SC100: Introduction to Electron-Beam Lithography
Electron-beam lithography is used for patterning photomasks, for writing directly on semiconductor substrates, and for research in nanofabrication. A brief history of the technique is given, and an overview is presented of the optical, mechanical, and electronic components that make an electron lithography tool. Writing methods will be compared and contrasted, including raster scan, vector scan, shaped beam, cell projection, and SCALPEL. Energy deposition physics in the resist film is described, with the resist exposure chemistry and development processes. Special attention is given to the proximity effect and correction. Tool limitations (resolution, throughput, and placement accuracy) are discussed. The course concludes with a forecast of the technology's future and how it relates to the ever-decreasing feature sizes in semiconductor manufacturing.
SC890: Electron-Beam Lithography – Current Use and Recent Advances
Electron-beam lithography is used for patterning photo masks, for writing directly on semiconductor substrates, and for R&D in nanofabrication. This course provides a brief history of the technique, and an overview of the electron-optical, mechanical, and electronic components that make an electron lithography tool. The advantages provided by this maskless, high resolution technology will be discussed together with its limitations set by the physics of charged particles. Writing methods will be compared and contrasted in their performance, including raster scan, vector scan, shaped beam, cell projection, and multi beam techniques. The most severe limitation of electron beam lithography tools is low throughput but limits of resolution and placement accuracy will be addressed as well. A particular focus will be on the recent advances in the state-of-the-art based on 'massively parallel' projection of pixels to overcome the throughput handicap. Several practical examples of these emerging lithography technologies are presented and the various technical challenges faced by the ongoing tool development efforts are discussed. You will be able to identify emerging lithographic technologies by their specific level of complexity which will enable you to judge their applicability in the semiconductor fabrication process and their opportunity for success. Applications considered for these new lithography tools under development are outlined in context of their lithographic capability, their business value and viability. The course provides a forecast of the technology's future and how it relates to the ever-decreasing feature sizes in semiconductor manufacturing.
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