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Mahendra Dubey
at KLA Idaho
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 27 April 2023 Presentation + Paper
OPO improvements by Moiré effect-based imaging
Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna
Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074
KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns
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