Dr. Nahee Park Profile

Dr. Nahee Park

at KLA Corp

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 27 April 2023 Presentation + Paper

OPO improvements by Moiré effect-based imaging

Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna

Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074

KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns

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Proceedings Article | 27 April 2023 Poster + Presentation + Paper

OPO robustness and measurability improvement via extended wavelengths

Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Yuqian Zhang

Proceedings Volume 12496, 1249613 (2023) https://doi.org/10.1117/12.2655161

KEYWORDS: Near infrared, Opacity, Metrology, 3D metrology, Photoresist processing, Overlay metrology, Image processing, Etching, Optical gratings

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Proceedings Article | 26 May 2022 Presentation + Paper

Overlay stability control in IBO measurement using rAIM target

Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, Dongyoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120530E (2022) https://doi.org/10.1117/12.2608053

KEYWORDS: Overlay metrology, Process control, Optical lithography, Metrology, Inspection, Semiconducting wafers, Data modeling, Wafer-level optics, Optical properties, Optical design

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