Dr. Yonglei Li Profile

Dr. Yonglei Li

at KLA Corporation

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation + Paper

Small pitch overlay imaging metrology targets for tight OPO control

Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy, Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama, Yoel Feler, Diana Shaphirov, Mark Ghinovker, Ido Ashuah, Yoav Grauer, Yonglei Li

Proceedings Volume 12955, 129551V (2024) https://doi.org/10.1117/12.3009769

KEYWORDS: Overlay metrology, Semiconducting wafers, Light sources and illumination, Metrology, Imaging metrology

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Proceedings Article | 27 April 2023 Presentation + Paper

OPO improvements by Moiré effect-based imaging

Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna

Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074

KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns

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Proceedings Article | 27 April 2023 Poster + Presentation + Paper

OPO robustness and measurability improvement via extended wavelengths

Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Yuqian Zhang

Proceedings Volume 12496, 1249613 (2023) https://doi.org/10.1117/12.2655161

KEYWORDS: Near infrared, Opacity, Metrology, 3D metrology, Photoresist processing, Overlay metrology, Image processing, Etching, Optical gratings

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Robustness improvement in imaging-based overlay metrology for high topography layers by Talbot targets

Brian Watson, Shlomit Katz, Richard Housley, Kar Wui Thong, Nikhil Aditya Kumar Roy, Yoav Grauer, Diana Shapirov, Raviv Yohanan, Greg Gray, Yonglei Li, Daniel Chalom

Proceedings Volume 11611, 1161133 (2021) https://doi.org/10.1117/12.2583831

KEYWORDS: Metrology, Optical parametric oscillators, Overlay metrology, Imaging metrology, 3D metrology, 3D acquisition

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