Mr. Taku Yamazaki Profile

Taku Yamazaki

Deputy General Manager at Gigaphoton Inc

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Author

Publications (32)

Proceedings Article | 26 May 2022 Presentation + Paper

Spectrum optimization during SMO: simultaneous source-mask-laser spectrum optimization

Evgeny Malankin, Neal Lafferty, Mikhail Silakov, Ekaterina Semenova, Takamitsu Komaki, Kouichi Fujii, Taisuke Miura, Gouta Niimi, Taku Yamazaki

Proceedings Volume 12052, 1205205 (2022) https://doi.org/10.1117/12.2614055

KEYWORDS: Source mask optimization, Electroluminescence, Metals, Photomasks, Light sources, Logic, SRAF, Lithography, Chromatic aberrations, Excimer lasers

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Tuning the spectrum of a scanner’s excimer laser light source is a well-known technique to achieve improved depth of focus (DOF) for an exposure. Previous studies have focused on the imaging improvement capabilities of readily available spectral shapes such as Gaussian E95 single peak width, as well as dual-peak spectral shapes where the spacing of the peaks can be varied. It is commonly known that adjustments in the laser spectrum must be carefully considered since exposure latitude (EL) can also be reduced as DOF is increased. By carefully engineering the laser’s spectrum, DOF can be maximized with very little impact to exposure latitude. Undesirable speckle contrast can also be reduced as laser bandwidth is increased. Traditionally, these approaches have been used to improve DOF of thick resist applications such as CMOS image sensors. Other areas such as NAND Flash have introduced laser spectrum engineering (SE) to compensate for topography effects between periphery and array regions. Recently, advances in laser hardware have enabled new and unique spectral shapes to be used for imaging. In this paper, we explore the various spectral profiles possible on the latest Gigaphoton GT66A ArFi light sources. New applications of these spectrum shapes are considered for foundry logic-type levels. First, a representative 14nm-node logic layer is considered. Source Mask Optimization (SMO) is performed while various widths of spectral profiles are used as input, such as traditional E95 Gaussian profiles, dual-peak, and flat top. By accounting for the laser spectrum during SMO, common DOF can be improved by ≥ 20% without a noticeable decrease in exposure latitude. The SMO sources and optimized masks are also different from each other and the nominal cases, depending on the spectral distribution used. Next, we explore simultaneously optimizing the laser spectrum, source, and mask in an experimental SMO+SE. Spectra can be constrained to keep symmetric profiles about the 193nm center point. Improved lithographic performance can result from the application of programmable laser spectra combined with pixelated sources and inverse lithography (ILT).

Proceedings Article | 23 February 2021 Poster + Presentation + Paper

Advanced spectral engineering: a new way of process improvements by laser spectra optimization for optical lithography

Koichi Fujii, Takahito Kumazaki, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki

Proceedings Volume 11613, 116130W (2021) https://doi.org/10.1117/12.2583670

KEYWORDS: Optical lithography, Laser processing, 3D image processing, Photoresist processing, Image processing, 3D image enhancement, Nanoimprint lithography, Lithography, Light sources, CMOS sensors

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Proceedings Article | 22 February 2021 Poster + Presentation

ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance

Toshihiro Oga, Shinichi Matsumoto, Taku Yamazaki, Takeshi Ohta, Satoru Bushida

Proceedings Volume 11613, 116130T (2021) https://doi.org/10.1117/12.2583729

KEYWORDS: Immersion lithography, Temporal coherence, Line width roughness, Yield improvement, Wavefronts, Wafer-level optics, Thermal effects, Speckle, Semiconducting wafers, Scanners

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Proceedings Article | 22 February 2021 Presentation

Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

Hirotaka Miyamoto, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki, Tsukasa Hori, Masato Moriya, Hiroshi Tanaka, Takuya Ishii, Akihiko Kurosu, Katsuhiko Wakana, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11613, 116130D (2021) https://doi.org/10.1117/12.2583281

KEYWORDS: Light sources, Speckle, Yield improvement, Extreme ultraviolet lithography, Immersion lithography, Spatial coherence, Temporal coherence, Line width roughness, Optical lithography, Lithography

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Proceedings Article | 22 February 2021 Poster + Presentation

Study of further image performance improvement by spectral bandwidth for ArFi lithography lightsource

Takamitsu Komaki, Shinichi Matsumoto, Koichi Fujii, Takehiko Tomonaga, Taku Yamazaki, Toshihiro Oga

Proceedings Volume 11611, 116112T (2021) https://doi.org/10.1117/12.2583731

KEYWORDS: Lithography, Deep ultraviolet, Semiconductors, Optical proximity correction, Error analysis, Thermography, Overlay metrology, Optical engineering, Extreme ultraviolet

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi light source

Takehiko Tomonaga, Tukasa Hori, Daisuke Tei, Taku Yamazaki, Tommy Oga

Proceedings Volume 11613, 116130S (2021) https://doi.org/10.1117/12.2583755

KEYWORDS: Light sources, Light, Semiconductors, Semiconducting wafers, Optical alignment, New and emerging technologies

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Proceedings Article | 23 March 2020 Paper

Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring feature

Futoshi Sato, Sophia Hu, Toshihiro Oga, Taku Yamazaki

Proceedings Volume 11327, 1132713 (2020) https://doi.org/10.1117/12.2551838

KEYWORDS: Light sources, Semiconductors, Manufacturing, Artificial intelligence, Semiconductor manufacturing, Deep ultraviolet, Agriculture, Lithography, Light, Amplifiers

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Proceedings Article | 13 February 2020 Paper

Productivity improvement by module life extension with software approach using Availability MAXimization (AMAX) functionality

Futoshi Sato, Sophia Hu, Toshihiro Oga, Taku Yamazaki

Proceedings Volume 10961, 109610W (2020) https://doi.org/10.1117/12.2515589

KEYWORDS: Semiconductors, Light sources, Software development, Medicine, Agriculture, Semiconductor manufacturing, Manufacturing, New and emerging technologies, Lithography, Surgery

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Proceedings Article | 6 June 2019 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10957, 1095716 (2019) https://doi.org/10.1117/12.2514033

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Mirrors, Tin, Plasma, Light sources, Laser development, Ions, Extreme ultraviolet lithography, Magnetism

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Proceedings Article | 18 March 2019 Presentation

Next generation ArF lightsource "T65A" for cutting-edge immersion lithography providing both high in productivity and performance (Conference Presentation)

Tommy Oga, Taku Yamazaki, Takeshi Ohta, Hiroaki Tsushima, Satoru Bushida

Proceedings Volume 10961, 109610L (2019) https://doi.org/10.1117/12.2515653

KEYWORDS: Immersion lithography, Optical design, Electrodes, Process control, Yield improvement, Manufacturing, Optics manufacturing, Wafer-level optics, Image resolution, Semiconducting wafers

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Proceedings Article | 12 October 2018 Presentation

Long collector mirror lifetime demonstration around 100W average LP-EUV source for semiconductor high volume manufacturing (Conference Presentation)

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodema, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10809, 1080906 (2018) https://doi.org/10.1117/12.2502015

KEYWORDS: Mirrors, Extreme ultraviolet, Carbon dioxide lasers, Semiconductor manufacturing, Semiconductors, High volume manufacturing, Light sources, Extreme ultraviolet lithography, Magnetism, Lithography

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Proceedings Article | 19 March 2018 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamatsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10583, 1058318 (2018) https://doi.org/10.1117/12.2299300

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 19 March 2018 Paper

Key components development progress updates of the 250W high-power LPP-EUV light source

Yoshifumi Ueno, Tsukasa Hori, Yasufumi Kawasuji, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10583, 1058328 (2018) https://doi.org/10.1117/12.2283066

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Magnetism, Pulsed laser operation

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Proceedings Article | 16 October 2017 Paper

Key components development progress updates of the 250W high power LPP-EUV light source

Takayuki Yabu, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Kenichi Miyao, Takuya Ishii, Yukio Watanabe, Tatsuya Yanagida, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10450, 104501C (2017) https://doi.org/10.1117/12.2280503

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Mirrors, Light sources, Magnetism, Solid state lasers, Control systems, Laser stabilization

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Proceedings Article | 16 October 2017 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10450, 104500Z (2017) https://doi.org/10.1117/12.2281129

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Performance of 250W high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10143, 101431J (2017) https://doi.org/10.1117/12.2256652

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Lithography, Extreme ultraviolet lithography, Plasma, Tin, Pulsed laser operation, Laser development, Gas lasers, Carbon monoxide, Amplifiers

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Proceedings Article | 24 March 2017 Paper

Key components technology update of the 250W high-power LPP-EUV light source

Yasufumi Kawasuji, Krzysztof Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, Yutaka Shiraishi

Proceedings Volume 10143, 101432G (2017) https://doi.org/10.1117/12.2257808

KEYWORDS: Carbon dioxide lasers, Light sources, Pulsed laser operation, Tin, Extreme ultraviolet, High power lasers, Solid state lasers, Magnetism, Gas lasers, Carbon monoxide, Laser applications, Amplifiers, Semiconductors

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Proceedings Article | 22 February 2017 Open Access

Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10097, 1009702 (2017) https://doi.org/10.1117/12.2261075

KEYWORDS: Extreme ultraviolet, Light sources, Lithography, Carbon dioxide lasers, Tin, Extreme ultraviolet lithography, Gas lasers, Carbon monoxide, Amplifiers, Plasma, Pulsed laser operation, Mirrors

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Proceedings Article | 13 January 2017 Paper

LPP-EUV light source for HVM lithography

T. Saito, Y. Ueno, T. Yabu, A. Kurosawa, S. Nagai, T. Yanagida, T. Hori, Y. Kawasuji, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, H. Mizoguchi

Proceedings Volume 10254, 102541A (2017) https://doi.org/10.1117/12.2257464

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Magnetism, Laser applications, Mirrors, Plasma, Ions

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Proceedings Article | 18 March 2016 Paper

Performance of new high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9776, 97760J (2016) https://doi.org/10.1117/12.2218405

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Lithography, High power lasers, Carbon dioxide, Laser systems engineering, Amplifiers, Tin, Pulsed laser operation, Light sources, Plasma, Magnetism, Extreme ultraviolet lithography, Ions

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Proceedings Article | 18 March 2016 Paper

100W EUV light-source key component technology update for HVM

Tsukasa Hori, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tamotsu Abe, Takeshi Okamoto, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 9776, 977625 (2016) https://doi.org/10.1117/12.2217947

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Plasma, Light sources, Laser systems engineering, High power lasers, Control systems, Mirrors, Lithography, Ions

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Proceedings Article | 13 March 2015 Paper

Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94222P (2015) https://doi.org/10.1117/12.2180269

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Light sources, Magnetism, Mirrors, Ions, Carbon dioxide, Laser applications

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Proceedings Article | 13 March 2015 Paper

Performance of one hundred watt HVM LPP-EUV source

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

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Proceedings Article | 17 April 2014 Paper

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9048, 90480D (2014) https://doi.org/10.1117/12.2046776

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Light sources, Plasma, Pulsed laser operation, Amplifiers, Laser systems engineering, Magnetism

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Since 2002, we have been developing a CO₂-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO₂ laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO₂ laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO₂ amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO₂ laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy ¹). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO₂ laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO₂ laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

Proceedings Article | 8 April 2013 Paper

LPP-EUV light source development for high volume manufacturing lithography

Proceedings Volume 8679, 86790A (2013) https://doi.org/10.1117/12.2014139

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Plasma, Magnetism, Chemical species, Laser systems engineering, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2012 Paper

Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida, Takeshi Ohta, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Hakaru Mizoguchi

Proceedings Volume 8322, 83220F (2012) https://doi.org/10.1117/12.916093

KEYWORDS: Carbon dioxide lasers, Tin, Extreme ultraviolet, Light sources, Magnetism, Plasma, Extreme ultraviolet lithography, Chemical species, Ions, Pulsed laser operation

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Proceedings Article | 11 April 2008 Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 27 March 2007 Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652031 (2007) https://doi.org/10.1117/12.711258

KEYWORDS: Molybdenum, High power lasers, Laser systems engineering, Laser applications, Light sources, Systems modeling, Semiconductors, Lithography, Electrodes, Pulsed laser operation

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Proceedings Article | 15 March 2006 Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 12 May 2005 Paper

High-power injection lock laser platform for ArF dry/wet lithography

H. Mizoguchi, T. Inoue, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Ohta, M. Nakane, M. Moriya, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, T. Ito, H. Umeda, S. Tanaka, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, N. Matsui, T. Mimura, K. Kakizaki, M. Goto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600796

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, 193nm lithography, Control systems, Light sources, Optical components, Oscillators, Laser development

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Proceedings Article | 28 May 2004 Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 26 June 2003 Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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